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Trends and Perspectives in deep-submicron IC design Bram Nauta MESA + Research Institute University of Twente, Enschede, The Netherlands University of Twente IWORID 2002
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Outline IC Technology trends Analog v.s. digital circuits How to design circuits in new technologies? Conclusion
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IC Technology Trends
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4004 8086 80286 80386 80486P5 (Pentium) P6 (Pentium Pro) Pentium II Merced Doubling every 1.9 year 2.75 year Moore’s Law Number of Transistors 80x86 Processors
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The ”ITRS" Roadmap 98200020022003200420052006200720082009201020112012992001 Advanced research (materials, architecture,..) 180 (nm) 150 130 100 200 300 400 450 400 450 Volume Production Integration/Pilot Basic steps/Modules Volume Production Basic steps/Modules 70 50 30 Precompetitive today
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Supply Voltage: V dd Why Low Voltage? Low power digital No breakdown today2012
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Threshold voltage: V T Vdd Vss I on I off 0VTVT V DD large I on small I off ON OFF IdId V gs
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V T dilemma Sub-threshold leakage becomes problem –low I dd during standby & test -> high V T –fast switching -> low V T dual V T Triple well (tune V T with voltage)
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Transistor speed: cut-off frequency log [Id/Ig] Frequency f t is about the intrinsic transistor, not interconnect f t is a measure for the speed of (analog) circuits IdId IgIg 0 ftft
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cut-off frequency
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Example 30 nm Devices [Intel] 30 nm physical gate length 0.8 nm conventional SiO 2 (N) mass production in 2009
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Interconnect: > 6 metal layers [Intel] Transistor gate length 70 nm Metal-1 width 180 nm
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Analog v.s. Digital Circuits
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Power dissipation for analog processing [Vittoz, ISCAS 1990] independent of technology
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Power dissipation for digital processing 1 bit extra -> 6dB more S/N operations/sec ~ n 2. f sig depends on technology [Vittoz, ISCAS 1990]
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Energy per transition: Vdd Idd C wire Etr=10pJ for 4um 5V CMOS Etr=1pJfor 1um 3V CMOS(1990) Etr=0.1pJ for 0.18um 1.8V CMOS(2000) ??????????(2020)
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downscaling lowers digital dissipation Signal/Noise [dB] Power dissipation analog digital
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IC Technology scaling Optimized for digital –digital = main chip area –minimize E tr –minimize cost per transistor Analog “has to live with this” –It cannot die
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How to design circuits in new technologies?
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Analog High voltage options for I/O & EEPROM –“old” transistors available in new technology Use the low V T –needed for digital speed anyway “non ideal” device behavior –gate leakage, non square law, –no real problem, better models needed Nominal V dd drops –no stacking
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psrr, cmrr, noise Change analog circuits V dd =V gs + V ds
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Analog matching of MOSFETS –becomes better for same W.L –new technology: V T drops linear with V dd 1/f noise –tends to increase for minimum size MOS f N ftft ftft ftft
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1/f noise Reduction: switched bias technique Constant Bias n-MOSFET V ON VTVT What about the Low-Frequency noise ? V OFF Switched Bias [Periodically switching the MOSFET “off”]
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LF noise spectrum (constant DC gate bias) Expected noise spectrum of switched bias [6 dB below] (for 50% duty cycle) Noise Power(dB) Frequency(log scale) Switching frequency Measured noise spectrum of switched bias [>>6dB below] (for 50% duty cycle) 1/f noise Reduction: switched bias technique
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analog RF: passives components Inductors –many metal layers + high ohmic substrate –high Q possible top view
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analog RF: passives components C: use fringe caps! cross section view
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Switched opamp technique V sig +V gs > V dd V sig V gs [Peluso, JSSC, july 97] V dd
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Analog: strategy Exploit the speed: –feedback @ high frequencies –noise canceling –dynamic element matching –sigma delta AD converters @ high frequencies Use digital for analog –always digital on the chip –use this for: calibration, digital filtering
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Digital transistor switching speed = no issue low voltage but still too high power !!! leakage -> dual V T –but which V T where? how to manage complexity? –100M transistors interconnect is speed bottleneck
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interconnect 1980 substrate
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interconnect 1995 substrate
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interconnect 2005 substrate
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Digital / interconnect bottleneck = wires –repeaters, synchronizers –globally asynchronous & locally synchronous use analog for digital –3D microwave techniques –“nano modems” ( more than just 1 and 0)
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High-voltage digital I/O “high voltage” by design: 5.5V I/O in 2.5V technology ! [Annema, JSSSC,March 2001]
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substrate bounce substrate L bondwire ground V dd
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substrate bounce substrate L bondwire ground V dd
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substrate bounce substrate L bondwire ground V dd
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substrate bounce Even 100% digital chip has problems Decouple supply in digital ( 30% area!) –locally! Use package with low inductance Make very robust analog designs
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Conclusion
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conclusions Technology scaling > 10 years Scaling of analog and digital circuits fundamentally different problems can be solved by design Digital for analog and analog for digital
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