1. Universal Microsystems, 3350 Scott Blvd. Bldg 47, Santa, Clara, CA 95054 Universal Microsystems Gas Flow Restrictors for the Semiconductor Industry Company founded in 1999 Partnership with TEM Filter 3350 Scott Blvd. Santa Clara, CA

2. Universal Microsystems, 3350 Scott Blvd. Bldg 47, Santa, Clara, CA 95054 Uses for Gas Flow Restrictors Replace MFC in fixed process applications –steady pressure, single flow set point Safety — limit flow in case of line failure Tamperproof needle valve replacement Flow splitting eliminates multiple MFCs Back fill a chamber in a fixed time

3. Universal Microsystems, 3350 Scott Blvd. Bldg 47, Santa, Clara, CA 95054 UMS Gas Flow Restrictors Orifice inside 316L SS container High accuracy calibration (± 1.0%) Three orifice materials available –SS, & Single crystal sapphire or silicon Quick turn production

4. Universal Microsystems, 3350 Scott Blvd. Bldg 47, Santa, Clara, CA 95054 Orifice Flow vs Pressure

5. Universal Microsystems, 3350 Scott Blvd. Bldg 47, Santa, Clara, CA 95054 Orifice Characteristics Completely stable No Particle Generation Minimal dry down time Precision of flow at specified pressure –+/- 5% standard, +/- 2% available Orifice will not clog like a filter

6. Universal Microsystems, 3350 Scott Blvd. Bldg 47, Santa, Clara, CA 95054 Restrictor body types available 1/4 “ Male/Male VCR 1/8” Male/Male VCR 1/4” Female/Male VCR 1/4” BulkHead VCR Ni media Filter/Restrictor Combination 1 1/8” surface mount sandwich

7. Universal Microsystems, 3350 Scott Blvd. Bldg 47, Santa, Clara, CA 95054 B-Series M/M VCR Flow Restrictor 1.55”.75”.625” 22-161414-00 VCR Male Union Flow Direction Arrow External Part No. Label

8. Universal Microsystems, 3350 Scott Blvd. Bldg 47, Santa, Clara, CA 95054 F/M or M/F Versions Gland to gland 1.80” Diameter 0.75” Wrench Flats 5/8”

9. Universal Microsystems, 3350 Scott Blvd. Bldg 47, Santa, Clara, CA 95054 Filter/Restrictor Combination Specifications  No more than 1 particle/ft 3 âLess than 10 ppb THC âLess than 10 ppb moisture â99.9999999% removal rating at rated flow  He leak check to 10 -9 atm sccm/sec Precise flow at a specified pressure

10. Universal Microsystems, 3350 Scott Blvd. Bldg 47, Santa, Clara, CA 95054 Surface Mount Sandwich Restrictor Restrictor can be inserted into either port 3 Port version available 2-port IGS configuration 1 1/8 ” body size Top Flow ¼”

11. Universal Microsystems, 3350 Scott Blvd. Bldg 47, Santa, Clara, CA 95054 UMS Flow Restrictor Specifications Surface finish, 7-8 Ra electropolish Base Material, 316L SS, Orifice material, Si, Sapphire, or SS Seal for Si (Viton or Kalrez) He leak check 10 -9 atm-cc/sec Maximum pressure, 200 psia Temperature range, 50 to 250 o F

12. Universal Microsystems, 3350 Scott Blvd. Bldg 47, Santa, Clara, CA 95054 Sapphire Orifices Orifice diameters from 0.003” to 0.040” Variation in diameter is +/- 2.5µm Different manufacturing runs likely to see different means but tight distribution -2.5 µm+2.5 µm Cross- Section Nozzle side

13. Universal Microsystems, 3350 Scott Blvd. Bldg 47, Santa, Clara, CA 95054 Silicon Orifices Used for diameters < 0.003” –or non-integer.001” units Flow from nozzle side 10-15% greater Avoid placing downstream from F plasma Option: sputter deposit Al 2 0 3 (both sides) Opportunity to enlarge undersized orifices –Oxidation and strip - 50 - 1000 nm Cross-section nozzle side 50 µm

14. Universal Microsystems, 3350 Scott Blvd. Bldg 47, Santa, Clara, CA 95054 Stainless Steel Orifices Mechanical drill OK down to 0.030” Use EDM down to 0.004” EDM precision is +/- 1.5% at.008” EDM most expensive of three types Cross-section 250 µm

15. Universal Microsystems, 3350 Scott Blvd. Bldg 47, Santa, Clara, CA 95054 Standard Orifices & N 2 flow @ 20 psig Flow range -15 sccm to 40 slm Flow steps in ~ 10% Sapphire orifices designated with N or R, SS orifices with F and Si orifices with S N orifices nozzle side inlet R orifices nozzle side outlet

16. Universal Microsystems, 3350 Scott Blvd. Bldg 47, Santa, Clara, CA 95054 How to find required orifice This procedure converts the application gas flow at the application pressure into the equivalent N 2 flow at 20 psig Match the converted flow to the flow table