1. Silicon Carbide Department of Electronics http://www.ttu.ee/elektron Prof. Dr. Toomas Rang trang@edu.ttu.eeAddress Ehitajate tee 5 19086 Tallinn ESTONIA Phone:+372 6 202 150 Fax:+372 6 202 151

2. Silicon Carbide – trend to top?

3. Silicon Carbide The crystal growth quality road map In 2005  3” wafers available  with 0.2 micropipes/cm 2  less than 50 dislocations/cm 2

4. Silicon Carbide Electronic Energy processing has many parallels with information processing  Both technologies have electromagnetics as a fundamental limit  Both technologies are eventually thermo- mechanically limited (i.e. in terms of interface reliability and loss density)  Both technologies are materials limited  New applications for both are driven by a relentless downward cost spiral

5. Silicon Carbide

6. 6.5x10 3 cm 2 in hour World Wide is minimum profitable production volume for semiconductor wafers Reality today is  Si6.5x10 6 cm 2 in hour  SiC6.5x10 2 cm 2 in hour (military)  SiC6.5x10 1 cm 2 in hour (others)

7. Silicon Carbide  Must we nevertheless continue with Silicon?

8. Silicon Carbide PropertySiGaAs3C-SiC6H-SiC4H-SiCDiamond Melting point [C] 142012382830283028304000 Thermal conductivity [W/cmK] 1.50.4654.94.920 Bandgap [eV] 1.11.432.393.023.265.45 Electron mobility [cm 2 /Vs] 15008500100037010002200 Hole mobility [cm 2 /Vs] 6004005090501600 Saturation electron drift velocity [x10 7 cm/s] 112.2222.7 Breakdown field [x10 5 V/cm] 36-2030100 Dielectric constant 11.812.59.79.79.75.5

9. Silicon Carbide

10.  Figures of merit  KFM – Key’s Figure of Merit (IC Applications)  KFJ – Johnson’s Figure of Merit (High Power Applications) KFMKFJ Si11 SiC6.5281

11. Silicon Carbide The major demands for metal layers are  Low resistivity for Ohmic, or low leakage currents for Schottky contacts  Easy to form  Easy to etch for pattern generation (e.g. microelectronics approach)  Stable in oxidizing ambient; (e.g. microelectronics approach)  Mechanical stability - good adherence, low stress;  Surface smoothness  Stability throughout processing  Generally no reaction with other metals  Should not contaminate devices, wafers, or working apparatus;  Long lifetimes  Low electromigration

12. Silicon Carbide Bonding process has the following important advantageous  one-step high temperature process for manufacturing multi-layer contacts (low energy process);  extra high adhesion between layers to be joined;  minimum number of inhomogeneities on large area (near defect free contacts);  improves significantly the certain electrical characteristics of manufactured semiconductor devices compared to other technologies

13. Silicon Carbide Cline’s initial proposal of two-stage mechanism describes the Diffusion Welding (DW)  The applied load causes plastic deformation of the surface asperities thereby reducing interfacial voids.  Bond development continues by diffusion controlled mechanism including grain boundary diffusion and power law creep Generally the surface should be prepared better than 0.4  m

14. Silicon Carbide Materials to be bonded  Direct Bonding  Interlayer needed  Not examined

15. Silicon Carbide Interlayers  Generally these layers are needed to join the incompatible materials, for example aluminum and steel.  Another use of compliant interlayer is to accommodate mismatch strains generated when bonding materials have widely different thermal expansion coefficient. This is important in joining ceramics to metals where a five to ten fold difference in thermal expansion coefficients is not usual.  A reason to reduce bonding temperature and time.

16. Silicon Carbide

17.  Adhesion test Temp [ 0 C] Pressure [MPa] Bond quality 50020-50None 55020-50Bad 60020Bad 60030 Very Good 60050Excellent

18. Silicon Carbide  Cristal Defects (comet tails, micropipes)

19. Silicon Carbide Screw and Edge Defects at the SiC Si-face surface

20. Silicon Carbide 4H-SiC wafer upper surface

21. Silicon Carbide  Structure and examples

22. Silicon Carbide  U-I characteristics

23. Silicon Carbide  Forward voltage drop:  (a) n 0 -n - – 4H-SiC (N d ~ 1x1015 cm –3 )  (b) p 0 -6H-SiC (N a ~ 5x1015 cm –3 )

24. Silicon Carbide SEM Picture (made in Furtwangen)

25. Silicon Carbide Inhomogeneities at the SIC surface  Bn2  Bn1  Bn3  Bn4

26. Silicon Carbide Schematic barrier height picture

27. Silicon Carbide Current distribution at Pt-Au-Pt 6H-SiC interface

28. Silicon Carbide Temperature distribution in Pt-Au-Pt 6H-SiC interface

29. Silicon Carbide Schottky interface: J = q(n m - n 0 ) v R n 0 = N C exp[-(q  Bn /k T)] n m = N C exp[-{q  (x m ) + q  Bn }/k T]

30. Silicon Carbide  What will come next?