1. EE 403 (or 503) Introduction to plasma Processing Fall 2011 Title of the project Your name

2. Outline -Introduction into your selected application -Equipment (Power Source, Reactor) -Plasma (properties: n e, T e, etc. & the role of the plasma species such electrons, photons, ions, atoms and molecules in your application) -Results (Advantages and disadvantages of plasma processing compared to other conventional techniques) -Conclusion -References & Links

4. 10 0 10 20 10 22 10 24 10 810 10 12 10 14 10 16 10 18 10 5 10 2 10 4 10 6 10 4 10 3 10 2 10 1 10 0 10 -1 Average Electron Energy, [eV] Electron Number density, [cm -3 ] Thermonuclear Plasmas Electron Beam Glow Discharge Arc Discharge Solid MHD Generator Ionosphere Solar Corona Interstellar Gas Gaseous Nebulae 1 cm 1 m 1  m 1 Å 1 nm 1 mm P = 100 Hz P = 10 KHz P = 1 MHz P = 100 MHz P = 10 GHz P = 1 THz Type of Plasma and Plasma Parameters

5. + + + + + + + + + DC, AC, RF, MW Power Supplies Capacitors Focused Laser Beam Electron and ion beams Coupling Solid (e.g. iron, copper, …) Liquid (Mercury, …) Gas (Ar, H 2, SF 6, …) Breakdown Man-Made Plasmas Maintenance