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VII. Semiconducting Materials & Devices
Band Structure and Terminology Intrinsic Behavior Optical Absorption by Semiconductors Impurity Conductivity Extrinsic Behavior Hall Effect and Hall Mobility The Diode: A Simple p-n Junction
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A. Band Structure and Terminology
Semiconductors and insulators have qualitatively similar band structures, with the quantitative distinction that the band gap Eg > 3.0 eV in insulators. conduction band valence band Energy band diagram in k-space “Flat-band” diagram in real space Ec = conduction band edge Ev = valence band edge
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Fermi-Dirac Distribution Function
The important external parameter that determines the properties of a semiconductor is the temperature T, which controls the excitation of electrons across the band gap in a pure (intrinsic) semiconductor. Fermi-Dirac distribution function The probability for an electron to be in an energy level at temperature T = chemical potential EF for T << TF For nearly all T of interest: This is the Maxwell-Boltzmann (classical) limit of Fermi-Dirac statistics So we can approximate:
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B. Intrinsic Behavior “Intrinsic” means without impurities. Electrical conductivity is zero at T = 0, but for T > 0 some electrons are excited into the conduction band, also creating holes (H+) in the valence band. In general the conductivity can be written (using the nearly FEG model): The conductivity is controlled by the magnitude of n and p, which rise exponentially as T increases. The relaxation times are only dependent on 1/T, and this dependence is often ignored because the exponential behavior dominates. as T due to increased scattering ( ) high-T (intrinsic) region low-T (extrinsic) region Experimentally we find that for a pure semiconductor:
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Intrinsic Carrier Statistics
It is relatively simple to calculate n(T) and p(T) for the intrinsic region, where the conductivity is caused by excitation of e- across the energy gap: e- in the conduction band: Ec = Eg h+ in the valence band: Ev = 0 For parabolic bands the density of states are: Think: why are we justified in assuming parabolic E(k) here?
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Intrinsic Carrier Statistics, cont’d.
We can write the density of states per unit volume: And now calculate the carrier concentration n(T): Now rearrange cleverly and pull out a factor of (kT)1/2: Which allows:
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Intrinsic Carrier Statistics, cont’d.
Now make a variable substitution: The integral becomes: So finally: Whew! And next we can do the same calculation for holes to get p(T)!
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Intrinsic Hole Carrier Statistics
Now for holes in the valence band: And since we have Just as before, calculate the carrier concentration p(T): Now rearrange : Replace –E with E and flip limits due to minus sign: Pull out a factor of (kT)1/2:
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Intrinsic Hole Carrier Statistics, cont’d.
Now make the variable substitution: The integral becomes: again! So finally: So far these relations for n(T) and p(T) are true for any semiconductor, with or without impurities. It is very convenient to calculate the product np:
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Intrinsic Carrier Statistics: Results
Now for an intrinsic semiconductor (or in the intrinsic region of a doped semiconductor) ni = pi, so: And equating the earlier expressions for n and p: This gives an expression for (T): So the chemical potential, or Fermi level, has some dependence on T, but if mh and me are similar, then this is very small.
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Carrier Mobility The total conductivity, including both the electron and hole contributions, is: It is common to define a quantity that expresses the size of the drift speed for each type of carrier in an electric field E: (Note: the carrier mobility is directly related to the switching speed of a solid-state electronic device) Definition of carrier mobility: Earlier FEG result: Now we can rewrite the total conductivity as: Experiment shows that has a power-law temperature dependence: Thus the exponential temperature dependence of n and p dominates, and we can approximate the intrinsic conductivity So a plot of vs. 1/T gives a straight line with slope –Eg/2k. Conductivity measurements allow us to determine Eg!
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C. Optical Absorption by Semiconductors
Examine the following calculated 3-D band structures for semiconductors Si and GaAs. What difference(s) do you see? Si GaAs Ec Ec Ev Ev Indirect band gap (kgap 0) Direct band gap (kgap = 0)
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Optical Absorption and Conservation Laws
Absorption of a photon by a semiconductor can promote an electron from the valence to the conduction band, but both energy and momentum must be conserved: For semiconductors Eg 1 eV so the photon wavevector can be estimated: But this is utterly tiny compared to a typical BZ dimension: So essentially we have: A direct-gap (vertical) transition
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Direct vs. Indirect Gap Semiconductors
But for indirect gap semiconductors it is clear that: So for an indirect gap transition momentum can only be conserved by absorption or emission of a phonon (lattice vibration) To estimate a typical phonon energy, we know:
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Optical Absorption: Experimental Results
Experimental absorption coefficients () are measured to be: While for an indirect gap material with a direct transition at a slightly higher energy:
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D. Impurity Conductivity in Semiconductors
Consider two types of substitutional impurities in Si: pure Si: (each line represents an e-) Si:P weakly bound extra electron donor energy level (n-type material) Si:B missing electron acceptor energy level (p-type material)
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Donor Impurities in Semiconductors
We can estimate the ionization energy of a pentavalent donor impurity using the Bohr model: Bohr model for H: +e -e, m r Ed For an electron orbiting a positive ion inside a semiconductor, what changes must we make in the Bohr model equations? periodic potential (effective mass): dielectric medium: So in a semiconductor:
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Donor Ionization Energy
Assuming that the electron is initially in its lowest energy level, the donor ionization energy Ed is: For Si we can use representative values of the effective mass and dielectric constant to obtain: P As Sb Si 45 49 39 All within a factor of two of our rough estimate! Experimental data reveal ionization energies (in meV): The orbital radius is predicted to be: So this electron moves through a region that includes hundreds of atoms, which supports the use of the dielectric constant of the bulk semiconductor.
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Acceptor Impurities in Semiconductors
What happens when the impurity atom is trivalent? At 0 K the acceptor level is empty, so a “hole” is bound to the impurity atom. However, the energy Ea is so small (50 meV in Si) that at room T electrons in the valence band bound to other Si atoms can be excited into the acceptor level, leaving behind a mobile hole in the valence band. Ea Summary: Both donor (P, As) and acceptor (B, Ga) impurities provide an easy way to increase either n or p even at low T. When such impurity-related carriers dominate the electrical properties, the semiconductor material displays extrinsic behavior. Note: If impurity concentration is very large, the Bohr orbits (wavefunctions) of the donor electrons can overlap and form an “impurity band” that extends throughout the material. This leads to a so-called insulator-metal transition and causes an abrupt increase in the conductivity (see problem 10.5).
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E. Extrinsic Behavior and Statistics
Let’s consider donor impurities in a semiconductor (n-type): Nd = concentration of donor atoms Nd+ = concentration of ionized donor atoms Nd0 = concentration of neutral donor atoms Now in the presence of a large donor e- concentration, then n >> ni so p must decrease in order to keep the product np = constant. What physical process causes p to decrease? Essentially the large number of e- in the conduction band will be sufficient to fill most available holes in the valence band, so that: and Ev = 0 Eg Eg-Ed
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Extrinsic Carrier Statistics
Now solve for the electron concentration n: Now from our earlier treatment of intrinsic behavior: Equating the expressions for n: You can always use this exact master eqn. to solve for and thus n, but you have to do it numerically.
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Limits of Low and High Impurity Concentrations
This discussion is relevant to several HW problems in Myers (see 10.4, 10.8, 10.9). It provides simple approximations for n and corresponding to very small Nd and very large Nd. We will develop approximations to simplify the solution of this eqn. Now consider two extreme limiting cases: Ev = 0 Eg Nd << n In Si at 300K (high T limit) Since Eg >> 2kT at room temp, this means And solving for : Thus,
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Limits of Low and High Impurity Concentrations
Ev = 0 Eg Eg-Ed 2. Nd >> n (low T limit) We can neglect the “1” in the denominator here: And now solve for : Does the low T limit make sense? Substituting into the above eqn. for n: Thus,
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Summary of Impurity Semiconductor Behavior
Now our schematic plot of ln vs. 1/T is even easier to understand:
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Extrinsic Behavior for p-Type Semiconductors
Let’s consider acceptor impurities in a semiconductor: Na = concentration of acceptor atoms Na- = concentration of occupied acceptor levels Na0 = concentration of neutral (unoccupied) acceptor levels Now in the presence of a large hole concentration, then p >> pi so n must decrease in order to keep the product np = constant. What physical process causes n to decrease? Essentially most of e- in the conduction band will fall down to fill up holes in the valence band, so that: and Ev = 0 Eg Ea
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Extrinsic p-Type Carrier Statistics
Now from our earlier treatment of intrinsic behavior: Equating the expressions for p: Again, you can always use this exact master eqn. to solve for and thus p, but you have to do it numerically.
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Limits of Low and High Impurity Concentrations
Here we provide simple approximations for p and corresponding to very small Na and very large Na. We will develop approximations to simplify the solution of this eqn. Now consider two extreme limiting cases: Ev = 0 Eg Na << p0 (high T limit) As before, we argue that is near Eg/2 as in the intrinsic case: Since Eg >> 2kT at room temp, this means Thus, And solving for :
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Limits of Low and High Impurity Concentrations
Ev = 0 Eg Ea 2. Na >> p (low T limit) We can neglect the “1” in the denominator here: And now solve for : Does the low T limit make sense? Substituting into the above eqn. for p: Thus,
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F. Hall Effect and Mobility
The Hall effect is easier to measure in semiconductors than in metals, since the carrier concentration is smaller: When one carrier dominates, we have a Hall coefficient: where Hall measurements can tell us whether a semiconductor is n-type or p-type from the polarity of the Hall voltage: B I w + - - + n-type p-type When one carrier dominates, we can write the conductivity: Measuring RH and will thus give: sign, concentration, and mobility of carrier, So the mobility can be written:
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General Form of Hall Coefficient
For a semiconductor with significant concentrations of both types of carriers: So if holes predominate (ph > ne ), RH > 0 and the material is said to be p-type, while if RH < 0 (as for simple metals), the material is said to be n-type.
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G. The Diode: A Simple p-n Junction
When p- and n-type materials are fabricated and brought together to form a junction, we can easily analyze its electronic properties. p n Na Nd Near the junction the free electrons and holes “diffuse” across the junction due to the concentration gradients there. As this happens, a contact potential develops. p n - + The field E due to the contact potential inhibits further flow of electrons and holes toward the junction, and equilibrium is established at finite . depletion region E
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Physics of a Simple p-n Junction
We can also describe the situation in terms of flat band diagrams. Ecp Evp Ecn Evn Initially (before equilibrium) Ecn Evn Ecp Evp e Finally (equilibrium established) Here we see “band bending” in equilibrium. This reflects the potential at the junction and the equalization of the chemical potential throughout the system.
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Physics of a Simple p-n Junction
In this dynamic equilibrium two types of carrier fluxes are equal and opposite: 1. recombination flux: electrons in the n-type region and holes in the p-type region “climb” the barrier, cross the junction, and recombine with h+/e- on the other side. 2. generation flux: thermally-generated electrons in the p-type region and holes in the n-type region are “swept” across the junction by the built-in electric field there. We can picture the carrier fluxes (currents): In equilibrium at V=0: Jng Jnr Jpr Jpg p-type n-type
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A Simple p-n Junction With Applied Voltage
Now when an external voltage V is applied to the junction, there are two cases: 1. Forward bias: electrons in the n-type region are shifted upward in energy Generation currents are not affected since they depend on excitation across band gap: e eV Recombination currents are increased by a Boltzmann factor, since they depend on carriers climbing the potential energy step at the junction (and Maxwell-Boltzmann statistics applies):
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Current-Voltage Relation for A Simple p-n Junction
We can now calculate the net current density from both holes and electrons: I > 0 so current flows from p n Is = “saturation current” 2. Reverse bias: electrons in the n-type region are shifted downward in energy e eV Here the only difference is that recombination currents are decreased by a Boltzmann factor, which just changes the sign of V in the exponential terms. So the resulting current is: I < 0 so current flows from n p (leakage current) We can express both cases in one “ideal diode equation” if we define forward bias to be V > 0 and reverse bias to be V < 0:
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Current-Voltage Relation for A Real Diode
What about in the real world? I V -Is Vbr The ideal diode equation is approximately correct, but we have made some assumptions that are not rigorously true, and have neglected other effects, so in a real diode we see behavior like this: Mechanisms for breakdown in reverse bias include: 1. Zener breakdown: a large reverse bias allows tunneling of electrons from valence band of p-type region to conduction band of n-type region, where they can carry current! 2. Avalanche breakdown: electrons generated in p-type region and swept across the junction acquire enough kinetic energy to generate other electrons, which in turn generate more, etc.
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