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Local workshop on e-beam lithography and related QEPL/Chalmers May 9, 2003
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Agenda Drawing software –AutoCAD Conversion (Alexi) Multiple current lithography and alignment strategies Other: –CASINO software: the scattering of electrons by matter (Serge) MgB2 vs YBCO: a nice case of substrate dependant dose (Serge) –Proximity effect simulations (Serge)
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Common references From the SNL webpages –http://fy.chalmers.se/assp/snl/http://fy.chalmers.se/assp/snl/ –JEOL_EXPRESS_ManualsJEOL_EXPRESS_Manuals Lithography operation guide BEAM 4TH BEAM 5TH Others: –JEOL-EOS-tables.pdfJEOL-EOS-tables.pdf
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From users References from S. Charlebois –Serge’s notes EBL and using AutoCADEBL and using AutoCAD –Serge's references for studentsSerge's references for students –Multi-chip holder sketchMulti-chip holder sketch –JEOL CassetteJEOL Cassette References from other users? JEBCAD: –To have default colors for various doses, place this script in the root directory JEBCAD_INITIAL.COMMAND JEBCAD_INITIAL.COMMAND
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