Download presentation
Presentation is loading. Please wait.
1
Etching Film deposition Photoresist coating Lithography Development Film etching Together with calibration sample Optical inspection Measure photoresist thickness Material characterization (magnetic, transport properties,... Resist strip Optical inspection Técnicas de Micro e Nanofabricação (2º semestre 2005/06) __________________ 1º Trabalho __________________ data: __________ __________________
2
Film deposition Photoresist coating Lithography Developing Film etching Resist strip Run Sheet #1-etching ConditionsProcess stepComments Deposition method: Machine: Deposition conditions: Substrate preparation substrate: Clean in Alconox solution + DI water Calibration sample: Mask : _________________ Map : ______________ Origin: X= ________, Y= _______ Energy : _______% ( Power : ______) Focus : ______Room Humidity: __________ vapor prime 5 minutes coat with 1.5 m PR (recipe 6/2) recipe 5/2 development time : ______ Etching method: Machine: Etching conditions: Microstrip________ @80ºC + ultrasonic Conditions for cleaning: Rinse with IPA + DI water + dry N 2 Total time in hot -strip Date: ______ Thickness to etch: Estimated etch time: Total time:
3
Lift-off Photoresist coating Lithography Development Film deposition Optical inspection Measure photoresist thickness Resist strip Material characterization (resistivity, index of refraction...) Measure film thickness Together with calibration sample
4
Film deposition Photoresist coating Lithography Developing Resist strip Run Sheet #1-liftoff ConditionsProcess stepComments Deposition method: Machine: Deposition conditions: Substrate preparation substrate: Clean in Alconox solution + DI water Calibration sample: Mask : _________________ Map : ______________ Origin: X= ________, Y= _______ alignment: YES / NO Energy : _______% ( Power : ______) Focus : ______Room Humidity: __________ vapor prime 5 minutes coat with 1.5 m PR (recipe 6/2) recipe 5/2 development time : ______ Microstrip________ @80ºC + ultrasonic Conditions for cleaning: Rinse with IPA + DI water + dry N 2 Total time in hot -strip Date: ______
Similar presentations
© 2025 SlidePlayer.com. Inc.
All rights reserved.