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Ribbon Cutting Ceremony Microelectronics Process Engineering Laboratory College of Engineering September 25, 2003.

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Presentation on theme: "Ribbon Cutting Ceremony Microelectronics Process Engineering Laboratory College of Engineering September 25, 2003."— Presentation transcript:

1 Ribbon Cutting Ceremony Microelectronics Process Engineering Laboratory College of Engineering September 25, 2003

2 Founding Partners Award Intel Corporation Dr. Jai Hakhu

3 Founding Partners Award Applied Materials, Inc. Dr. David N.K. Wang

4

5 Microelectronics Process Engineering Program Highlights BS degree curriculum Fab-based courses Enhancements to traditional BS curricula Workforce development activities

6 Current process capabilities Metal Deposition and Etch Diffusion and Oxidation Photo- lithography Oxide RIE Wet Chem Etch/Clean Intel Applied Materials Novellus AMD Cypress Quintel

7 Current design facilities Hardware: –500MHz Logic Analyzer –40 Sun workstations –280 Sunfire server CAD Software –Cadence Design Systems –Synopsys –Silvaco

8 Student Impact 2000-03  ProE Courses Basic IC Processing (EE/MatE129) –Fabricate and test devices –NMOS technology –207 students Advanced Thin Film Processes (MatE/ChE166) –Statistics/DOE –Metrology and thin film dep/etching –32 students Microelectronics Mfgr Methods (EE/MatE167) –CMOS technology/SPC –Sea of Gates developed –37 students

9 Student Impact 2000-03 Related Courses Electronic Design I (EE122) –Pilot study in which students designed a current mirror Introduction to Engineering (E10) –Solar cell testing –500 students/year Electronic Properties of Materials (MatE153) –Solar cell processing –300 students/year Introduction to Materials (MatE25) –Lithography (souvenirs) –250 student/year

10 Research Activity LDMOS devices Nitride Gate oxide MEMs projects RIE characterization Photovoltaics Internships

11 Impact 2000-03 Workforce Development Creating interest in semiconductor technology and engineering High school/community college instructor workshop SEMI’s Workforce Development Institute Workshop (HS students) Community college class visits Discover Camp (high school students)

12 Next Big Things Addition of CVD/polysilicon growth –Allow self-aligned gate technology –Reduction in mask set –Allow Analog Leaf Cell manufacture entirely in-house –Allow MEMs research –Enhanced materials science component Analog-Mixed Signal (AMS) designs –very sensitive to manufacturing variations –Students will do design/manufacture/test –Enhancement to EE curriculum Materials Characterization Facility

13 Let’s go meet the students and tour the facility!


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