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Microelectronics Processing Course J. Salzman Fall 2006 1 Microelectronics Processing Course Introduction
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3 Conductivity in solids Resistivity [ cm] Conductivity [ cm] -1 10 -8 10 18 10 -18 10 8 10 3 10 -8 10 8 10 -3 Ag Cu Al Glass Pure Diamond Quartz Si Semiconductors Conductors Insulators GaAs
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Microelectronics Processing Course J. Salzman Fall 2006 4 History 1904 Vaacum Tube 1925 Concept of Field Effect Transistor 1947 Bipolar Transistor 1958 Bipolar IC 1959 MOS Transistor 1961 IC-MOS Technology 1972 MOS Microprocessor
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7 Moore Law (Gordon Moore 1965) The number of transistors in a chip will be doubled every 18 months
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Microelectronics Processing Course J. Salzman Fall 2006 11 MOS Transistor Source Drain Gate
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Microelectronics Processing Course J. Salzman Fall 2006 12 MOS Transistor Source Drain Gate Electrons in inversion layer
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Microelectronics Processing Course J. Salzman Fall 2006 13 Drain Gate Source W L t ox Substrate Metal contact Schottky contact Si 2 O
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Microelectronics Processing Course J. Salzman Fall 2006 14 Optical Measurements Photometric Interferometric Polarization Spectroscopic
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Microelectronics Processing Course J. Salzman Fall 2006 15 Basic Optical Instruments Microscope Reflectometer (Nanospec) Ellipsometer
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