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Device Sizing Techniques for High Yield Minimum-Energy Subthreshold Circuits Dan Holcomb and Mervin John University of California, Berkeley EE241 Spring 2008
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Model of Sub-Vt Energy Sub-Vt Operation offers Minimum Energy for low performance systems Theoretical Optimal Vdd can be found from: Variation complicates the design!
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Impact of Major Design Parameters Optimal Vdd set by relative significance of dynamic and leakage energy – ->but higher Vdd reduces impact of variation Reduced Logic Depth reduces leakage time – ->but longer paths average out delay variability Minimum Sized have lowest C eff – ->but
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Model of Variation W, L mismatch Vt variation has significant impact on subthreshold circuit functionality
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Evaluating Failure using SNM Logic levels determine functionality – Challenging in subthreshold NAND-NOR circuit – NAND has most stringent V IH requirement – NOR has most stringent V IL 15mV margin
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Inferring Gate Failure Rates Monte Carlo SNM analysis has limitations – We infer failure rate from SNM distribution – Good agreement with accepted method
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Sizing to Minimize Supply Voltage Design Goal – Min Energy with 80% yield at 100k gates Optimal P:N ratio =.5 – Sweep sizing to find maximum SNM Upsizing enables lower voltages – Does low-voltage lead to min-energy?
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Current and Delay Variability Current and Delay variability decreases with upsizing To meet timing constraints, have to operate circuit at slowest path
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Conclusions Optimal sizing is highly dependent on loading. – Optimal and stacking can also vary – Upsize according to loading
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Backup Optimize inner loop SNM calculation
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Finding P/N Ratio Finding
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