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O Initial CZ wafer
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High temperature annealing
O 2 O 2 O 2 O 2 O 2 O 2 O 2 O 2 O 2 O 2 O 2 O 2 O 2 O High temperature annealing
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High temperature annealing
O 2 O 2 O 2 O 2 O 2 O 2 O 2 O 2 O 2 O 2 O 2 O 2 O 2 denuded zone O High temperature annealing
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Nucleation at low temperature
denuded zone O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O O Nucleation at low temperature
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Distribution of nuclei sizes
denuded zone Distribution of nuclei sizes
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Precipitate growth at moderate temperature
denuded zone Precipitate growth at moderate temperature
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Growth of crystal defects (dislocations)
denuded zone Growth of crystal defects (dislocations)
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Rapid diffusion of metal contamination
denuded zone Rapid diffusion of metal contamination
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M denuded zone M M M M M M Gettering
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Release of contaminants due to late high temperature anneal
denuded zone O M M M M M M M Release of contaminants due to late high temperature anneal
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