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Spring 2007EE130 Lecture 36, Slide 1 Lecture #36 ANNOUNCEMENTS Updated information for Term Project was posted on 4/14 Reminder: Coffee Hour today at ~4PM! OUTLINE The MOSFET: Qualitative theory Long-channel I-V (“Square-Law” Theory) Reading: Textbook Chapter 17.2, 18.3.4
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Spring 2007EE130 Lecture 36, Slide 2 Qualitative Theory of the NMOSFET depletion layer The potential barrier to electron flow from the source into the channel is lowered by applying V GS > V T Electrons flow from the source to the drain by drift, when V DS >0. (I DS > 0.) The channel potential varies from V S at the source end to V D at the drain end. (The inversion layer can be modeled as a resistor.) V GS < V T : V GS > V T : V DS 0 V DS > 0
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Spring 2007EE130 Lecture 36, Slide 3 When V D is increased to be equal to V G -V T, the inversion-layer charge density at the drain end of the channel equals zero, i.e. the channel becomes “pinched off” As V D is increased above V G -V T, the length L of the “pinch-off” region increases. The voltage applied across the inversion layer is always V Dsat =V GS -V T, and so the current saturates: If L is significant compared to L, then I DS will increase slightly with increasing V DS >V Dsat, due to “channel-length modulation” V GS > V T : V DS = V GS -V T V DS > V GS -V T
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Spring 2007EE130 Lecture 36, Slide 4 Ideal MOSFET I-V Characteristics Linear region Saturation region (Enhancement Mode NMOS Transistor)
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Spring 2007EE130 Lecture 36, Slide 5 Impact of Inversion-Layer Bias When a MOS device is biased into inversion, a pn junction exists between the surface and the bulk. If the inversion layer contacts a heavily doped region of the same type, it is possible to apply a bias to this pn junction. N+ poly-Si p-type Si - - - - - - ++++++ N+ ++ - -- SiO 2 V G is biased so that surface is inverted n-type inversion layer is contacted by N+ region If a bias V C is applied to the channel, A reverse bias (V B -V C ) is applied between the channel & body
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Spring 2007EE130 Lecture 36, Slide 6 Effect of V CB on S, W, and V T Application of a reverse body bias non-equilibrium –2 Fermi levels (one for n-region, one for p-region) separation = qV BC S is increased by V CB Reverse body bias widens W, increases Q dep Q inv decreases with increasing V CB, for a given V GB
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Spring 2007EE130 Lecture 36, Slide 7 NMOSFET I-V Characteristics V D > V S Current in the channel flows by drift Channel voltage V C (y) varies continuously between the source and the drain Channel inversion charge density W
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Spring 2007EE130 Lecture 36, Slide 8 1 st -Order Approximation If we neglect the variation of Q dep with y, then where V T = threshold voltage at the source end:
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Spring 2007EE130 Lecture 36, Slide 9 NMOSFET Current (1 st -order approx.) Consider an incremental length dy in the channel. The voltage drop across this region is in the linear region in the saturation region
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Spring 2007EE130 Lecture 36, Slide 10 saturation region: Saturation Current, I Dsat
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