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Microelectronics Circuit Analysis and Design Donald A. Neamen
Chapter 3 The Field Effect Transistor Neamen Microelectronics, 4e Chapter 3-1 McGraw-Hill
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In this chapter, we will:
Study and understand the operation and characteristics of the various types of MOSFETs. Understand and become familiar with the dc analysis and design techniques of MOSFET circuits. Examine three applications of MOSFET circuits. Investigate current source biasing of MOSFET circuits, such as those used in integrated circuits. Analyze the dc biasing of multistage or multitransistor circuits. Understand the operation and characteristics of the junction field-effect transistor, and analyze the dc response of JFET circuits. Neamen Microelectronics, 4e Chapter 3-2 McGraw-Hill
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Basic Structure of MOS Capacitor
Neamen Microelectronics, 4e Chapter 3-3 McGraw-Hill
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MOS Capacitor Under Bias: Electric Field and Charge
Parallel plate capacitor Negative gate bias: Positive gate bias: Holes attracted to gate Electrons attracted to gate Neamen Microelectronics, 4e Chapter 3-4 McGraw-Hill
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Schematic of n-Channel Enhancement Mode MOSFET
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Basic Transistor Operation
Before electron inversion layer is After electron inversion layer is formed formed Neamen Microelectronics, 4e Chapter McGraw-Hill
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Basic Transistor Operation
Neamen Microelectronics, 4e Chapter 3-7 McGraw-Hill
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Current Versus Voltage Characteristics: Enhancement-Mode nMOSFET
Neamen Microelectronics, 4e Chapter 3-8 McGraw-Hill
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Family of iD Versus vDS Curves: Enhancement-Mode nMOSFET
Neamen Microelectronics, 4e Chapter 3-9 McGraw-Hill
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p-Channel Enhancement-Mode MOSFET
Neamen Microelectronics, 4e Chapter 3-10 McGraw-Hill
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Enhancement-Mode MOSFET
Symbols for n-Channel Enhancement-Mode MOSFET Neamen Microelectronics, 4e Chapter 3-11 McGraw-Hill
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Enhancement-Mode MOSFET
Symbols for p-Channel Enhancement-Mode MOSFET Neamen Microelectronics, 4e Chapter 3-12 McGraw-Hill
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n-Channel Depletion-Mode MOSFET
Neamen Microelectronics, 4e Chapter 3-13 McGraw-Hill
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Family of iD Versus vDS Curves: Depletion-Mode nMOSFET
Symbols Neamen Microelectronics, 4e Chapter 3-14 McGraw-Hill
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p-Channel Depletion- Mode MOSFET
Symbols Neamen Microelectronics, 4e Chapter 3-15 McGraw-Hill
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Cross-Section of nMOSFET and pMOSFET
Both transistors are used in the fabrication of CMOS circuitry. Neamen Microelectronics, 4e Chapter 3-16 McGraw-Hill
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Summary of I-V Relationships
Neamen Microelectronics, 4e Chapter 3-17 McGraw-Hill
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Enhancement and Depletion Mode
In field-effect transistors (FETs), depletion mode and enhancement mode are two major transistor types, corresponding to whether the transistor is in an ON state or an OFF state at zero gate-source voltage. Enhancement-mode MOSFETs are the common switching elements in most MOS logic families. These devices are OFF at zero gate-source voltage, and can be turned on by pulling the gate voltage in the direction of the drain voltage; that is, toward the VDD supply rail, which is positive for NMOS logic and negative for PMOS logic. In a depletion-mode MOSFET, the device is normally ON at zero gate-source voltage. Such devices are used as load "resistors" in logic circuits (in depletion-load NMOS logic, for example). Neamen Microelectronics, 4e Chapter 3-18 McGraw-Hill
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Enhancement and Depletion Mode
For an n-channel enhancement -mode MOSFET, a positive gate to source voltage greater than the threshold voltage VTN must be applied to induce an electron inversion layer. For VGS > VTN the device is turned on. For an n-channel depletion-mode MOSFET, a channel between source and drain exists even for VGS=0. The threshole voltage is negative, so that a negative voltage is required to turn the device off. Current voltage relations are the ideal relations for long channel devices. Long channel devices are the ones whose channel length is 2um. However we are in the order of 0.2um nowadays. Neamen Microelectronics, 4e Chapter 3-19 McGraw-Hill
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Non-ideal Current Voltage Characteristics
Finite output resistance Body effect Subthreshold conduction Breakdown effects Temperature effects Neamen Microelectronics, 4e Chapter 3-20 McGraw-Hill
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Channel Length Modulation: Early Voltage
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Body Effect The occupancy of the energy bands in a semiconductor is set by the position of the Fermi level relative to the semiconductor energy-band edges. Application of a source-to-substrate reverse bias of the source-body pn-junction introduces a split between the Fermi levels for electrons and holes, moving the Fermi level for the channel further from the band edge, lowering the occupancy of the channel. The effect is to increase the gate voltage necessary to establish the channel, as seen in the figure. This change in channel strength by application of reverse bias is called the body effect. Neamen Microelectronics, 4e Chapter 3-22 McGraw-Hill
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Subthreshold Condition
As MOSFET geometries shrink, the voltage that can be applied to the gate must be reduced to maintain reliability. To maintain performance, the threshold voltage of the MOSFET has to be reduced as well. As threshold voltage is reduced, the transistor cannot be switched from complete turn-off to complete turn-on with the limited voltage swing available; the circuit design is a compromise between strong current in the "on" case and low current in the "off" case, and the application determines whether to favor one over the other. Subthreshold leakage (including subthreshold conduction, gate-oxide leakage and reverse-biased junction leakage), which was ignored in the past, now can consume upwards of half of the total power consumption of modern high-performance VLSI chips Neamen Microelectronics, 4e Chapter 3-23 McGraw-Hill
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NMOS Common-Source Circuit
Neamen Microelectronics, 4e Chapter 3-24 McGraw-Hill
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PMOS Common-Source Circuit
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Load Line and Modes of Operation: NMOS Common-Source Circuit
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Problem-Solving Technique: NMOSFET DC Analysis
1. Assume the transistor is in saturation. a. VGS > VTN, ID > 0, & VDS ≥ VDS(sat) 2. Analyze circuit using saturation I-V relations. 3. Evaluate resulting bias condition of transistor. a. If VGS < VTN, transistor is likely in cutoff b. If VDS < VDS(sat), transistor is likely in nonsaturation region 4. If initial assumption is proven incorrect, make new assumption and repeat Steps 2 and 3. Neamen Microelectronics, 4e Chapter 3-27 McGraw-Hill
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