1. Introduction to Microfabrication Nick Ferrell Biomedical Engineering

2. Basics of Microfabrication Developed by microelectronics industry Adapted for silicon MEMS Refined for nanoscale fabrication Extended to polymer micro/nanofabrication

3. Basic Processing-Photolithography Coating and Exposure

4. Latent Image Formation Develop-Positive ToneDevelop-Negative Tone

5. Limits of Photolithography Minimum Features Size α Exposure Wavelength Spectrum for Hg Arc Lamp (365 and 436 nm) http://www.cairnweb.com/tech/tech_lamp2.html

6. Nanofabrication Excimer Lasers: KrF (248 nm) ArF (193 nm) F 2 (157 nm) X-rays, EUV (10-40 nm) E-beam: (.0037 nm @ 100kV) X-ray (70 nm) E-beam (43 nm) Ito, Okazaki, Nature 408 (2000), 1027-1031.

7. Polymer Micro/Nanofabrication Polymer Properties Wide range of physical and chemical properties Biocompatible Cheap Techniques Hot Embossing Injection Molding Soft Lithography - Microtransfer Molding - Microcontact Printing - Micromolding in Capillaries - Sacrificial Layer Micromolding

8. Hot Embossing J. Narasimhan, I. Papautsky, J. Micromech. Microeng. 14(2004), 85-105

9. Soft Lithography Figure 2. Chemical structure of PDMS. -Cheap -Easy -Quick -Robust Rapid Prototyping Y. Xia, G.M. Whitesides, Soft Lithography, Angew. Chem Int. Ed. 37(1998), 550-575.

10. Soft Lithography

11. Microcontact Printing

12. Sacrificial Layer Micromolding

13. Multi-layer Patterning HEAT (110° C) SU8 PDMS PPMA

14. PDMS

15. OH CH 3 O 2 Plasma CH 3 OH Si O O O O PDMS Bonding