1. J. B. Hastings jbh@slac.stanford.edu LUSI DOE Review July 23, 2007 X-ray Optics 1 X-ray Optics J. B. Hastings Beam definition Attenuators Slits Pulse picker Focusing Be lens Kirkpatrick-Baez Mirror systems Diffractive optics Monochromator Pulse compressor Split and delay Summary Beam definition Attenuators Slits Pulse picker Focusing Be lens Kirkpatrick-Baez Mirror systems Diffractive optics Monochromator Pulse compressor Split and delay Summary

2. J. B. Hastings jbh@slac.stanford.edu LUSI DOE Review July 23, 2007 X-ray Optics 2 6 1 2 4 5 1SXR Imag 2AMOS (LCLS) 3XR pump-probe Full instrument 4XPCS Full instrument 5CXI Full instrument 6HEDS 1SXR Imag 2AMOS (LCLS) 3XR pump-probe Full instrument 4XPCS Full instrument 5CXI Full instrument 6HEDS LCLS LUSI HEDS (NNSA) Offset Monochromator Exp. Chamber Detector Beam Transport LUSI schematic XPP 3 XCS CXI

3. J. B. Hastings jbh@slac.stanford.edu LUSI DOE Review July 23, 2007 X-ray Optics 3 Instruments XCS XPPCXI

4. J. B. Hastings jbh@slac.stanford.edu LUSI DOE Review July 23, 2007 X-ray Optics 4 Attenuators XCSXPPCXI Attenuators Variable, up to 10 6 reduction High damage threshold (Be or B 4 C) Attenuators Variable, up to 10 6 reduction High damage threshold (Be or B 4 C)

5. J. B. Hastings jbh@slac.stanford.edu LUSI DOE Review July 23, 2007 X-ray Optics 5 Slits System XCSXPPCXI Slit systems Variable horizontal and vertical gap from 5 μm – 5 mm Can withstand full LCLS flux – unfocused Minimize background scatter from blades Slit systems Variable horizontal and vertical gap from 5 μm – 5 mm Can withstand full LCLS flux – unfocused Minimize background scatter from blades B. Lengeler et al., J. Synchrotron Rad., 6, 1153-1167 (1999).

6. J. B. Hastings jbh@slac.stanford.edu LUSI DOE Review July 23, 2007 X-ray Optics 6 Pulse Picker XCSXPPCXI Pulse picker Permit LCLS operation at 120 hz Single pulses. Useful for samples supported on substrates Reduced rate ex. 10 hz operation High damage threshold Use rotating discs, concept already in use at ESRF Pulse picker Permit LCLS operation at 120 hz Single pulses. Useful for samples supported on substrates Reduced rate ex. 10 hz operation High damage threshold Use rotating discs, concept already in use at ESRF

7. J. B. Hastings jbh@slac.stanford.edu LUSI DOE Review July 23, 2007 X-ray Optics 7 Be Focusing Lenses XCSXPPCXI Beryllium CRL > 40% throughput Positioning resolution and repeatability to 1 µm Z translation to vary spot size Beryllium CRL > 40% throughput Positioning resolution and repeatability to 1 µm Z translation to vary spot size

8. J. B. Hastings jbh@slac.stanford.edu LUSI DOE Review July 23, 2007 X-ray Optics 8 KB Mirror XCSXPPCXI

9. J. B. Hastings jbh@slac.stanford.edu LUSI DOE Review July 23, 2007 X-ray Optics 9 KB focusing mirrors Mirror system (1 µm and 0.1 µm KB) KB mirrors have produced 50 nm focuses of SR (Yamauchi et al., SRI 2006). Bent plane mirrors – or pre-figured Achromatic focusing. Use B 4 C as coating Damage resistant Good reflectivity

10. J. B. Hastings jbh@slac.stanford.edu LUSI DOE Review July 23, 2007 X-ray Optics 10 KB Pair for 0.1 μ m focus Grazing angle 0.2 Deg B 4 C coating Horz. Mirror 20 cm Vert. Mirror 10 cm Focal spot size (FWHM in microns) Horz: 0.097 Vert: 0.083

11. J. B. Hastings jbh@slac.stanford.edu LUSI DOE Review July 23, 2007 X-ray Optics 11 LLNL has state-of-the-art surface metrology for the figure, mid- and high spatial frequency ranges Slope error = 100  rad rms  = 2.7 Ǻ rms  = 17.6 Ǻ rms AFM R. Soufli, E. Spiller, M. A. Schmidt, J. C. Robinson, S. L. Baker, S. Ratti, M. A. Johnson, E. M. Gullikson, Opt. Eng. 43(12), 3089-3095 (2004).

12. J. B. Hastings jbh@slac.stanford.edu LUSI DOE Review July 23, 2007 X-ray Optics 12 The LLNL DC-magnetron sputtering system can fit multiple large- area substrates in a single deposition 4-mirror and 2-mirror EUV cameras have been multilayer-coated in a single deposition run, achieving optic-to-optic wavelength matching within 1  = 0.010 nm Underneath view of LLNL chamber lid with 5 sputtering targets R. Soufli, E. Spiller, M. A. Schmidt, J. C. Davidson, R. F. Grabner, E. M. Gullikson, B. B. Kaufmann, S. L. Baker, H. N. Chapman, R. M. Hudyma, J. S. Taylor, C. C. Walton, C. Montcalm, and J. A. Folta, Proc. SPIE 4343, 51-59 (2001).

13. J. B. Hastings jbh@slac.stanford.edu LUSI DOE Review July 23, 2007 X-ray Optics 13 Stress and roughness vs. pressure Lower pressure films reduce roughness Also increase stress Curves shift upwards as thickness grows Favor thinner films grown at higher pressures  Higher micro-roughness, minimize risk of delamination

14. J. B. Hastings jbh@slac.stanford.edu LUSI DOE Review July 23, 2007 X-ray Optics 14 Offset Monochromator XCSXPPCXI ParameterValue Energy Range6 – 24 keV Horizontal Offset600 mm Scattering Angle9 0 - 50 0  Accuracy 0.02 arcsec χ Accuracy4 arcsec Double Crystal Offset monochromator Increase longitudinal coherence length (narrow X-ray spectrum) Multiplexes LCLS beam Double Crystal Offset monochromator Increase longitudinal coherence length (narrow X-ray spectrum) Multiplexes LCLS beam

15. J. B. Hastings jbh@slac.stanford.edu LUSI DOE Review July 23, 2007 X-ray Optics 15 Offset Monochromator Double Crystal Offset monochromator for 2 µm Si (111) @ 1.5 Å 85% transmission,2.5% - Mono beam, 1.3% - Diagnostics beam Double Crystal Offset monochromator for 2 µm Si (111) @ 1.5 Å 85% transmission,2.5% - Mono beam, 1.3% - Diagnostics beam Scattering Angles (2 theta) 1.5 Å0.5 Å Silicon 111 27.6°9.1° Silicon 220 45.8°14.9° Diamond 111 42.5°13.9° Diamond 220 -22.8°

16. J. B. Hastings jbh@slac.stanford.edu LUSI DOE Review July 23, 2007 X-ray Optics 16 Pulse Compressor XCSXPPCXI λ (nm) d (nm) θBθB bSin β H (mm) Δλ/λ (%) 0.152.02.1º+10.0326000.5% Parameters for a Laue case pulse compressor for the LCLS.

17. J. B. Hastings jbh@slac.stanford.edu LUSI DOE Review July 23, 2007 X-ray Optics 17 Split and Delay XCSXPPCXI Provided by DESY/SLAC MoU Prototype existing 1 st Commissioning May 2007 pulse duration < delay < 3 ns based on Si (511) with 2 θ = 90º E=8.389 keV Provided by DESY/SLAC MoU Prototype existing 1 st Commissioning May 2007 pulse duration < delay < 3 ns based on Si (511) with 2 θ = 90º E=8.389 keV

18. J. B. Hastings jbh@slac.stanford.edu LUSI DOE Review July 23, 2007 X-ray Optics 18 Summary Optical components are conceptually the same as those for SR experiments: slits, attenuators, double crystal monochromators, refractive lens, KB focusing Optical components are in general not beyond state of the art Characteristics of the LCLS beam demand extreme precision and damage tolerance: sub-micro radian rotations, B 4 C coatings Multiplexing capability relies on thin Si or perfect diamond crystals