1. Mg 2 NiH 4 thin films synthesis results

2. Main goals: hydrogenation of Mg 2 Ni thin films in high hydrogen pressure and temperature (p,T); analysis of Mg 2 Ni films after hydrogenation (p,T) using XRD and SEM methods.

3. Parameters of hydrogenation Pressure – 8 bar Temperature – 180 - 250 °C Hydrogenation duration – 1 hours

4. Mg 2 Ni films after plasma hydrogenation (p,T) XRD diffractogram of Mg 2 Ni film after hydrogenation SEM micrograph of of Mg 2 Ni film after hydrogenation

5. Mg 2 Ni films after plasma hydrogenation (p,T) XRD diffractogram of Mg 2 Ni film after hydrogenation SEM micrograph of of Mg 2 Ni film after hydrogenation

6. Mg 2 Ni films after plasma hydrogenation (p,T) XRD diffractogram of Mg 2 Ni film after hydrogenation SEM micrograph of of Mg 2 Ni film after hydrogenation

7. Mg 2 Ni films after plasma hydrogenation (p,T) XRD diffractogram of Mg 2 Ni film after hydrogenation SEM micrograph of Mg 2 Ni film after hydrogenation

8. Mg 2 Ni films after plasma hydrogenation (p,T) XRD diffractogram of Mg 2 Ni film after hydrogenation SEM micrograph of Mg 2 Ni film after hydrogenation

9. Mg 2 Ni films after plasma hydrogenation (p,T) XRD diffractogram of Mg 2 Ni film after hydrogenation SEM micrograph of Mg 2 Ni film after hydrogenation

10. Mg 2 Ni films after plasma hydrogenation (p,T) XRD diffractogram of Mg 2 Ni film after hydrogenation SEM micrograph of Mg 2 Ni film after hydrogenation

11. Conclusions  1-4 µm nanocrystalline Mg 2 Ni thin film was successfully formatted using magnetron sputtering;  After the hydrogenation of Mg 2 Ni thin films in hydrogen atmosphere, in high pressure and high temperature, Mg 2 NiH 4 thin films were successfully formed.  SEM analysis shows that after hydrogenation formation of the “bubbles” in the Mg 2 NiH 4 thin films are observed.