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Agilent 7500 ICP-MS Date: 28JUL2005
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What is ICP-MS? 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 H He Li Be B C N O F Ne Na Mg Al Si P S Cl Ar K Ca Sc Ti V Cr Mn Fe Co Ni Cu Zn Ga Ge As Se Br Kr Rb St Y Zr Nb Mo Tc Ru Rh Pd Ag Cd In Sn Sb Te I Xe Cs Ba L Hf Ta W Re Os Ir Pt Au Hg Tl Pb Bi Po At Rn Fr Ra A Rf Db Sg Bh Hs Mt La Ce Pr Nd Pm Sm Eu Gd Tb Dy Ho Er Tm Yb Lu Ac Th Pa U Np Pu Am Cm Bk Cf Es Fm Md No Lr
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Atomic Spectroscopy (I)
Atomic Absorption Spectroscopy Graphite Furnace AAS ICP-Mass Spectroscopy Inductively Coupled Plasma - Optical Emission Spectroscopy Nucleus Electron
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Atomic Spectroscopy (II)
FAAS High Precision ICP-MS Quantitation Sensitivity GFAAS High Sensitivity Low Detection Limits ICP-OES Multi-element Simultaneous Analysis Spectral Interferences
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ICP-MS Schematic Diagram
5. Isolation Valve 8. Detector 3. Plasma 2. Spray Chamber 7. Mass Filter 4. Off-axis Lens 6. ORS 1. Nebulizer
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Sample Introduction Device
Ar blend gas To ICP Babington Nebulizer Al insulation Sample solution cover Ar carrier gas Peltier cooling device Cooling water
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Mass flow Control Auxiliary Gas (1L/min) Carrier Gas (1.2L/min) +
6. Ion Lenses 2. Spray Chamber 4. Interface Auxiliary Gas (1L/min) Carrier Gas (1.2L/min) + Sample Blend Gas (0.6L/min) Plasma Gas (15~16L/min)
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+ Ionization by Plasma ID 2.5mm, Flow 0.2~0.4ml/min 1. Drying
2. Spray Chamber ID 2.5mm, Flow 0.2~0.4ml/min 1. Drying 3. Atomization 4. Ionization 2. Decomposition
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Distribution of Plasma
27.12MHz S Sample 40MHz 27.12MHz S 40MHz
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Cool Plasma Interference 39K 38Ar1H 40Ca 40Ar 56Fe 40Ar16O Work coil
Torch Shield plate
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Cool Plasma Normal Plasma Cool Plasma Shield plate
Forward Power: 1300W Sampling Depth: 7mm Carrier Gas Flow: 1.2ml/min Forward Power: 900W Sampling Depth: 13mm Carrier Gas Flow: 1.7ml/min
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Ionization Efficiency
Mg Mg, Fe, As Fe Cl As Ar Cl Ar
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Optimum gas flow Co Sensitivity ArH ArO Carrier gas flow
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Extraction Lens Twin Extraction Lenses Sampling cone Skimmer cone
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Why need ORS? Interference Matrix 39K 38Ar1H UPW 40Ca 40Ar 56Fe 40Ar16O 51V 35Cl16O HCl 52Cr 35Cl16O1H 75As 40Ar35Cl 48Ti 32S16O H2SO4 64Zn 32S16O16O 63Cu 31P16O16O H3PO4 68Zn 31P18O18O1H 24Mg 12C12C Organics 40Ar12C There are some applications where cool plasma does not meet current and future required performance levels for certain analytes: several interfered analytes in high ( ppm) Si matrices interfered analytes (Ti, Zn) in high matrix acids H2SO4 and H3PO4 Agilent’s Octopole Reaction Cell can remove these interferences…
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Off-axis Lens
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Dissociation He As 75amu 75amu Ar Cl 40amu 35amu Ar Cl 75amu Ar Cl
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Energy Transfer As He 75amu Ar Cl 75amu Electric Potential
(Quadrupole)
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Reaction mode Charge Transfer Ar+ + H2 H2+ + Ar (neutral)
Proton Transfer Ar2+ + H2 Ar2H+ + H (80amu) (81amu)
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Mass Filter 3MHz True Hyperbolic Quadrupole 3MHz RF Generator
Peak Shape Abundance Sensitivity 3MHz
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Dual Electron Multiplier
Fast Analogue Detection Pulse Counting Detection M+ e e Dynode
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Wide Dynamic Range Dynamic Range: 9 orders Analog Mode
1000ppm Dynamic Range: 9 orders Analog Mode Pulse Counting Mode Solid type Multiplier 1ppt
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ICP-MS Schematic Diagram
5. Isolation Valve 8. Detector 3. Plasma 2. Spray Chamber 7. Mass Filter 4. Off-axis Lens 6. ORS 1. Nebulizer
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Flexibility [I-Autosampler] [HPLC-ICP-MS] [ORS Technology] [GC-ICP-MS]
[Organic Kit]
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Sample Type Waters Chemicals Semiconductor Food Geological Clinical
Forensic Petrochemical Nuclear
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