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Metal-Oxide- Semiconductor (MOS) Field-Effect Transistors (MOSFETs)
EENG 3510 Chapter 4 Metal-Oxide- Semiconductor (MOS) Field-Effect Transistors (MOSFETs)
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4.42(a for Figures (a) & (b), assume saturation in (a)),
Chapter 4 Homework 4a 4.5, 4.7a&b, D4.14, D4.34, 4.36, 4.42(a for Figures (a) & (b), assume saturation in (a)),
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Chapter 4 Homework 4b 4.51, 4.59, 4.58, 4.64a, 4.69, 4.99
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Introduction From Diode to Transistor Two types of Transistors Topics
Two terminals to three terminals Use of the voltage between two terminals to control the current flowing in the third terminal Two types of Transistors MOSFETs: metal oxide semiconductor field effect transistors (chapter 4) BJT: bipolar junction transistor (chapter 5) Topics Physical structure and operations Terminal characteristics Circuit models Basic circuit applications: amplifier and logic inverter
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Metal-Oxide- Semiconductor (MOS) Field-Effect Transistors (MOSFETs)
Most important component in modern digital integrated circuits Used in microprocessors Used in computer memory
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4.1 Device Structure and Physical Operation (Physical structure of the enhancement-type NMOS transistor) cross-section perspective view Typically L = 0.1 to 3 mm, W = 0.2 to 100 mm, and the thickness of the oxide layer (tox) is in the range of 2 to 50 nm.
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4.1 Device Structure and Physical Operation
Source (S) connects to Body (B), Drain (D) is at a positive voltage relative to S, two pn junctions are cut off Substrate: no effect on device operation →3 terminals device Source and drain can be interchanged
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4.1.4 Applying a Small VDS An NMOS transistor with vGS (gate voltage) > Vt (threshold voltage)and with a small vDS applied. The device acts as a resistance whose value is determined by vGS. Specifically, the channel conductance is proportional to vGS – Vt’ and thus iD is proportional to (vGS – Vt) vDS. Note that the depletion region is not shown (for simplicity).
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4.1.4 Applying a Small VDS (Cont.)
The iD (drain current) – vDS (drain voltage) characteristics of the MOSFET in the above slide when the voltage applied between drain and source, vDS, (drain source) is kept small. The device operates as a linear resistor whose value is controlled by vGS (gate source).
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4.1.5 Operation as VDS Is Increased
Operation of the enhancement NMOS transistor as vDS is increased. The induced channel acquires a tapered shape, and its resistance increases as vDS is increased. Here, vGS is kept constant at a value > Vt.
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4.1.6 Derivation of the ID –VDS relationship
The drain current iD versus the drain-to-source voltage vDS for an enhancement-type NMOS transistor operated with vGS > Vt.
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4.1.8 Complementary MOS or CMOS
Cross-section of a CMOS integrated circuit. Note that the PMOS transistor is formed in a separate n-type region, known as an n well. Another arrangement is also possible in which an n-type body is used and the n device is formed in a p well.
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Symbols for enhancement-type MOSFETs
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4.2 Current-Voltage Characteristics 4.2.1 Circuit Symbol
(a) Circuit symbol for the n-channel enhancement-type MOSFET. (b) Modified circuit symbol with an arrowhead on the source terminal to distinguish it from the drain and to indicate device polarity (i.e., n channel). (c) Simplified circuit symbol to be used when the source is connected to the body or when the effect of the body on device operation is unimportant.
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4.2.2 The ID –vDS Characteristics
There are three distinct regions of operation: The cut-off region The triode region The saturation region
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4.2.2 The ID –vDS Characteristics (Cont.)
(a) An n-channel enhancement-type MOSFET with vGS and vDS applied and with the normal directions of current flow indicated. (b) The iD–vDS characteristics for a device with k’n (W/L) = 1.0 mA/V2.
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4.2.2 The ID –vDS Characteristics (Cont.)
Cut off region
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4.2.2 The ID –vDS Characteristics (Cont.)
Triode region The N-channel enhancement-type MOSFET Operates in the triode region when vGS is greater than Vi and the drain voltage is lower than the gate voltage by at least Vt .
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Triode Region Example
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Triode Region Example (Cont.)
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Problem 4.7c&d
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Problem 4.7c&d (Cont.) ox for silicon = 3.45x10-11
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4.2.2 The ID –vDS Characteristics (Cont.)
Saturation region The N-channel enhancement-type MOSFET Operates in the saturation region when vGS is greater than Vi and the drain voltage does not fall below the gate voltage by more than Vt .
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Saturation Region Example
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4.2.2 The ID –vDS Characteristics (Cont.)
Saturation region The iD–vGS characteristic for an enhancement-type NMOS transistor in saturation (Vt = 1 V, k’n W/L = 1.0 mA/V2).
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4.2.2 The ID –vDS Characteristics (Cont.)
Large-signal equivalent-circuit model of an n-channel MOSFET operating in the saturation region
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4.2.3 Finite Output Resistance in Saturation
IDEAL: a change vDS causes zero change in ID , which means infinite output resistance Increasing vDS beyond vDSsat causes the channel pinch-off point to move slightly away from the drain, thus reducing the effective channel length (by L).
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4.2.3 Finite Output Resistance in Saturation
Eq. 4.22 Eq. 4.24 Large-signal equivalent circuit model of the n-channel MOSFET in saturation, incorporating the output resistance ro. The output resistance models the linear dependence of iD on vDS and is given by Eq. (4.22).
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4.3 MOSFET Circuit At DC
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Example 4.2 Design the circuit of Fig so that the transistor operates at ID=0.4mA and VD=+0.5V. The NMOS transistor has Vt=0.7V, μnCox=100 μA/V2, L = 1 μm, and W=32 μm. Neglect the channel-length modulation effect (i.e. assume that λ=0). RD= ?, RS = ?
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Example 4.2 (Cont.)
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Example 4.2 (Cont.)
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Another Design Example
Figure 1
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Example 4.4 Design the circuit in Fig to establish a drain voltage of 0.1 V. What is the effective resistance between drain and source at this operating point? Let Vt=1 V, k’nW/L=1mA/V2.
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Example 4.4 (Cont.)
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Example 4.4 (Cont.)
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Another Design Example
Assume saturation Figure 2
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Figure (c) Assume saturation ID = 2 = (½)(1)(Vov)2) (Vov)2 = 4
Vov = 2 , However, Vov = -2 V since pmos circuit VGS = Vt + Vov = = - 4 Thus Vs = 4 V = V4 V5 = ( - (2.5x103)(2x10-3)) = = -5 V
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Figure (d) ID = 2 = (½)(1)(Vov)2) (Vov)2 = 4
Vov = 2 , However, Vov = -2 V since pmos circuit VGS = Vt + Vov = = - 4 , Vs = 4 V6 = 10 – 4 = 6 V V7 = 6 – 4 = 2 V
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4.4 The MOSFET As An Amplifier and As A Switch
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4.4.1 Large-signal Operation –The Transfer Characteristic
Common Source Amplifier (CS) To determine the voltage transfer characteristic between vI and vO VI = vGS VO = vDS = VDD - RD iD Graphically and analytically Basic structure of the common-source amplifier Graphical construction to determine the transfer characteristic of the amplifier in (a). vDS= VDD-RDiD iD= (VDD-vDS)/RD
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4.4.2 Graphical Derivation of the Transfer Characteristic
Transfer characteristic showing operation as an amplifier biased at point Q.
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4.4.3 Operation As Switch
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4.4.4 Operation as a Linear Amplifier
Two load lines and corresponding bias points. Bias point Q1 does not leave sufficient room for positive signal swing at the drain (too close to VDD). Bias point Q2 is too close to the boundary of the triode region and might not allow for sufficient negative signal swing.
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4.4.5 Analytical Expressions for the Transfer Characteristic
Cutoff-Region Segment, XA vI< Vt, and vO= VDD
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4.4.5 Analytical Expressions for the Transfer Characteristic (Cont.)
Saturation-Region Segment, AQB Av = - 2 (VDD – VOQ) / VOV = - (2VRD) / VOV
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Example
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Example (Cont.) Av = - 2 (VDD – VOQ) / VOV = - (2VRD) / VOV
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4.4.5 Analytical Expressions for the Transfer Characteristic (Cont.)
Triode-Region Segment, BC
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4.5 Biasing In MOS Amplifier Circuits
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4.5.1 Biasing by Fixing VGS Most straightforward Device dependent
Temperature dependent Variability The use of fixed bias (constant VGS) can result in a large variability in the value of ID. Devices 1 and 2 represent extremes among units of the same type.
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4.5.2 Biasing by Fixing VG and Connecting a Resistance in the Source
Reduced Variability Biasing using a fixed voltage at the gate, VG, and a resistance in the source lead, RS: (a)basic arrangement; (b)reduced variability in ID;
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4.5.2 Biasing by Fixing VG and Connecting a Resistance in the Source (Cont.)
Biasing using a fixed voltage at the gate, VG, and a resistance in the source lead, RS: (c) practical implementation using a single supply; (d) coupling of a signal source to the gate using a capacitor CC1; (e) practical implementation using two supplies.
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Example 6 Bias current does not change
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Example
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4.5.3 Biasing Using a Drain-to-Gate Feedback Resistor
Biasing the MOSFET using a large drain-to-gate feedback resistance, RG.
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Problem 4.64b
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4.5.4 Biasing Using a Constant-Current Source
Biasing the MOSFET using a constant-current source I. Implementation of the constant-current source I using a current mirror.
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4.5.4 Biasing Using a Constant-Current Source (Cont.)
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4.6 Small-Signal Operation And Models
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4.6.1 The DC Bias Point Set vgs to zero Conceptual circuit utilized to study the operation of the MOSFET as a small-signal amplifier.
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4.6.2 The Signal Current in the Drain Terminal
Conceptual circuit utilized to study the operation of the MOSFET as a small-signal amplifier. iD = the instantaneous drain current ID = the DC Bias Current To reduce nonlinear distortion, the input signal should be kept small so that: VO
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4.6.3 The Voltage Gain Conceptual circuit utilized to study the operation of the MOSFET as a small-signal amplifier.
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4.6.4 Separating the DC Analysis and the Signal Analysis
Conceptual circuit utilized to study the operation of the MOSFET as a small-signal amplifier.
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4.6.5 Small Signal Equivalent-Circuit Models
neglecting the dependence of iD on vDS in saturation (the channel-length modulation effect) including the effect of channel-length modulation, modeled by output resistance ro = |VA| /ID. VA = 1/ (where = the channel-length modulation effect) r0 = 10K to 1000K
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4.6.6 The Transconductance gm
In contrast, gm for a bipolar junction transistor (BJT) is proportional to ID and is independent of the physical size And geometry of the device.
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Example
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Example a ID = (1/2) x 1 x (5 – 1)2 2ID = 42 = 16 ID = 8 mA
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Example b Gm = 1 x (5 – 1) = 4 mA/V
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Example c AV = - 4mA x 4K = -16 V/V
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Example d AV = - 4mA x (4K || 12.5K) = - 3.03 V/V
output resistance ro = |VA| /ID VA = 1/ (where = the channel-length modulation effect) rO = 1 / (0.01 x 8mA) = 1 / 0.08mA = 12.5 K AV = - 4mA x (4K || 12.5K) = V/V
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4.6.7 The T Equivalent-Circuit Model
Development of the T equivalent-circuit model for the MOSFET. For simplicity, ro has been omitted but can be added between D and S in the T model of (d).
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4.6.7 The T Equivalent-Circuit Model (cont.)
The T model of the MOSFET augmented with the drain-to-source resistance ro. An alternative representation of the T model.
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4.6.9 Summary Small Signal Parameters Transconductance:
Output Resistance: Small Signal Equivalent Circuit Models Hybrid-π model T models
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4.7 Single-Stage MOS Amplifiers
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4.7.1 The Basic Structure Basic structure of the circuit used to realize single-stage discrete-circuit MOS amplifier configurations
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4.7.2 Characterizing Amplifiers
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4.7.2 Characterizing Amplifiers (cont.)
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4.7.2 Characterizing Amplifiers (cont.)
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4.7.3 The Common-Source (CS) Amplifier
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4.7.3 The Common-Source (CS) Amplifier (cont.)
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4.7.3 The Common-Source (CS) Amplifier (cont.)
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4.7.4 The Common-Source Amplifier with a Source Resistance
Common-source amplifier with a resistance RS in the source lead. Small-signal equivalent circuit with ro neglected.
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4.7.4 The Common-Source Amplifier with a Source Resistance
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Problem 77
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Problem 77a VG = 15 x (5/15) = 5 V VS = 3ID = VGS = 5 - 3ID
ID = (1/2)(2)(5 - 3ID - 1)2 0 = ID + 9ID2 ID = 1 mA VGS = 5 - 3ID = 2 V VD = 15 – (7.5K x 1mA) = 7.5 V
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Problem 77b Gm = 2 ID / VOV = (2 x 1) /(2 – 1) = 2 mA
rO = VA / ID = 100/1mA = 100K
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Problem 77c
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Problem 77d x x
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4.7.5 The Common-Gate (CG) Amplifier
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4.7.5 The Common-Gate (CG) Amplifier (cont.)
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4.7.6 The Common-Drain (CD) or Source-Follower Amplifier
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4.7.6 The Common-Drain (CD) or Source-Follower Amplifier (cont.)
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4.7.6 Summary and Comparisons
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4.7.6 Summary and Comparisons (cont.)
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4.7.6 Summary and Comparisons (cont.)
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4.7.6 Summary and Comparisons (cont.)
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