1. Magnetic Nanofluidics ME342 Design Project Update 3 Abhishek Dhanda Kwan-Kyu Park Michael Pihulic Katherine Tsai July 27, 2006

2. Equipment Training Completed  Katherine: STS2  Abhishek: Metallica  Kwan-Kyu: P-5000 Pending  WBGEN for gold liftoff  Drytek 1 and 4 Super Users  J Provine

3. Process Update

4. Progress Masks  Chrome Masks Berkeley staff on vacation Fabricated by Photo Sciences in Torrance, CA Sent in GDSII files 7/19 Masks received 7/25, next day shipping Costs : $380 / Mask  E-beam Test runs starting Friday Layouts completed

5. Progress Materials  Wafer Inventory 5 SOI’s 18 Primes  Tweezers  Carriers

6. Progress Characterization  STS2 Characterize etch rate of poly-Si and Si (microchannels) 4 primes with polysilicon  P5000 Characterize etch rate of poly-Si (nanochannels)  Metalica Characterize film thickness precision 1 prime  Front side lithography 1 um SPR3612 Exposure times= approx 1.8 sec 8 primes, with Front Side Etch mask

7. Emergent Problems Equipment (past or present or future?) down  STS1 --> Solution: STS at Berkeley  Karl Suss  Tylan1  Dektak (gold contaminated) Fluorescence microscope in Kovac’s labs  Depending on strength of our signal may need filters to improve selectivity  Filters cost a lot ($1000 each)  Access to Prof. Santiago’s micro-PIV setup?

8. Emergent Solutions Mask issues at both SNF and BSAC resolved by using Photo Sciences Metal tweezers in stock! How will we do litho on pyrex wafer?  Unable to selectively etch  Anodically bond devices individually

9. Future Work Current week  Characterizing P-5000 for polysilicon etch  Characterizing Metallica for gold sputtering  Oxide etch with P-5000 for backside etch using STS in Berkeley.  Send in 2nd mask set (where?)  Ebeam patterning Next week  Finish microchannels device fabrication  Begin testing

10. Lessons Learned Put photoresist on the correct side. Nighttime is good time for processing. (Midnight~5AM)