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Semiconductor Memories Lecture 1: May 10, 2006 EE Summer Camp Abhinav Agarwal.

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Presentation on theme: "Semiconductor Memories Lecture 1: May 10, 2006 EE Summer Camp Abhinav Agarwal."— Presentation transcript:

1 Semiconductor Memories Lecture 1: May 10, 2006 EE Summer Camp Abhinav Agarwal

2 Outline Concept/need of memory Parameters Types/classification Basic features Basic Cell circuits Peripheral circuitry

3 Concept Data storage essential for processing Binary storage Switches How do you implement this in Hardware?

4 Requirements Easy reading Easy Writing High density Speed, more speed and still more speed

5 Memory Chip Configuration

6 © Digital Integrated Circuits 2nd Memories Semiconductor Memory Classification Read-Write Memory Non-Volatile Read-Write Memory Read-Only Memory EPROM E 2 PROM FLASH Random Access Non-Random Access SRAM DRAM Mask-Programmed Programmable (PROM) FIFO Shift Register CAM LIFO

7 RAM Random write and read operation for any cell Volatile data Most of computer memory DRAM  Low Cost  High Density  Medium Speed SRAM  High Speed  Ease of use  Medium Cost

8 ROM Non-volatile Data Method of Data Writing Mask ROM  Data written during chip fabrication PROM  Fuse ROM: Non-rewritable  EPROM:Erase data by UV rays  EEPROM: Erase and write through electrical means Speed 2-3 times slower than RAM Upper limit on write operations Flash Memory – High density, Low Cost

9 Basic Cells DRAM SRAM

10 © Digital Integrated Circuits 2nd Memories Static CAM Memory Cell

11 © Digital Integrated Circuits 2nd Memories CAM in Cache Memory Address Decoder Hit Logic CAM ARRAY Input Drivers TagHit Address SRAM ARRAY Sense Amps / Input Drivers DataR/W

12 ROM Fuse ROM EEPROM Floating Gate

13 © Digital Integrated Circuits 2nd Memories MOS NAND ROM All word lines high by default with exception of selected row WL[0] WL[1] WL[2] WL[3] V DD Pull-up devices BL[3]BL[2]BL[1]BL[0]

14 © Digital Integrated Circuits 2nd Memories Non-Volatile Memories The Floating-gate transistor (FAMOS) Floating gate Source Substrate Gate Drain n + n +_ p t ox t Device cross-section Schematic symbol G S D

15 © Digital Integrated Circuits 2nd Memories Floating-Gate Transistor Programming 0 V - 5 V 0 V DS Removing programming voltage leaves charge trapped 5 V - 2.5 V 5 V DS Programming results in higherV T. 20 V 10 V5 V 20 V DS Avalanche injection

16 © Digital Integrated Circuits 2nd Memories A “Programmable-Threshold” Transistor

17 © Digital Integrated Circuits 2nd Memories Periphery  Decoders  Sense Amplifiers  Input/Output Buffers  Control / Timing Circuitry

18 © Digital Integrated Circuits 2nd Memories Row Decoders Collection of 2 M complex logic gates Organized in regular and dense fashion (N)AND Decoder NOR Decoder

19 © Digital Integrated Circuits 2nd Memories Hierarchical Decoders A 2 A 2 A 2 A 3 WL 0 A 2 A 3 A 2 A 3 A 2 A 3 A 3 A 3 A 0 A 0 A 0 A 1 A 0 A 1 A 0 A 1 A 0 A 1 A 1 A 1 1 Multi-stage implementation improves performance NAND decoder using 2-input pre-decoders

20 © Digital Integrated Circuits 2nd Memories Sense Amplifiers t p C  V  I av ----------------= make  V as small as possible smalllarge Idea: Use Sense Amplifer output input s.a. small transition

21 © Digital Integrated Circuits 2nd Memories Sense Amp Operation D V(1) V V(0) t V PRE V BL Sense amp activated Word line activated

22 © Digital Integrated Circuits 2nd Memories Differential Sense Amplifier Directly applicable to SRAMs M 4 M 1 M 5 M 3 M 2 V DD bit SE Out y

23 © Digital Integrated Circuits 2nd Memories Reliability and Yield

24 References Digital Integrated Circuits, 2 nd Edition, Jan Rabaey, Anantha Chandrakasan, Borivoje Nikolic Chapter 12 http://bwrc.eecs.berkeley.edu/IcBook/slides.htm http://bwrc.eecs.berkeley.edu/IcBook/slides.htm Sedra & Smith, Microelectronic Circuits, 4 th Edition, Chapter 13  Section 13.9, 13.10, 13.11, 13.12 VLSI Memory Chip Design, Kiyoo Itoh


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