1. Adam Kueltzo Thornton Fractional North High School August 2nd, 2012 University of Illinois at Chicago Advanced Materials Research Laboratory (AMReL) Mentors: Sathess Selvaraj, Jorge Rossero, Dr. C.G. Takoudis, and Dr. G. Jursich Departments of Bioengineering and Chemical Engineering

2. Purpose Develop a plan for construction of an transportable atomic layer deposition (ALD) reactor ALD reactor will be transported to Argonne National Laboratory In-situ X-ray analysis at the Advanced Photon Source (APS)

4. Experimental Station at APS

5. Goals Assess the current status of the ALD system in place Vacuum pump completed …pressure…temperature… Configuration completed…valves…gaskets…tubing Flow meter control completed Other goals to will be met soon

6. Vacuum Pump Wasn’t pumping down to low enough pressure -30mTorr Tested at machine shop and singled out problems in lab Now pumping down to 10 mTorr Called company and verified parameters

7. Mass-flow meter calibration Found that the flow rate measured was double that found on flowmeter controller. Compared controller to bubble test. Flowmeter 1 – 144-148 cc/min Flowmeter 2 – 148-156 cc/min Flowmeter 3 – 180-190 cc/min

8. Flow Bubble Test

9. Work still in progress Must be designed for transportation Precursor and water bubbler design Metal framing for reactor Exhaust pipe modification Module and solenoid placement Movable reactor Finalize water delivery

10. Precursor Bubbler

11. Precursor Bubbler- Conflat-lid type Volume ~ 150 cc T ~ 200 0 C P ~ 300 mTorr

12. Water Bubbler

13. Water Delivery Line MKS P 3-way valve To reactor Water bath Flow meter From cylinder

14. Exhaust pipe modification

15. Proposed modification

16. System Schematic

17. Purpose Verify growth rate of Cerium Oxide using precursor- Tris(i-propylcyclopentadienyl)cerium Possible use as electrolyte when Yttrium doped in Solid Oxide Fuel Cells (SOFC) High ionic conductivity and lower operating temperature (700 o C) Allows for use of more readily available and cheaper materials

18. Current ALD Status

19. ALD Process “One Cycle” Precursor Purge (N 2 ) Oxidizer (H 2 O) Purge (N 2 ) http://www.cambridgenanotech.com/

20. Results

21. Current Testing TEM imaging taking place 400 cycle sample Annealed 600 o C and 800 o C As deposited

22. Acknowledgments CBET-NSF Grant #1142255 Mentors - Dr. Takoudis and Dr. Jursich Doctoral Students - Sathess Selvaraj and Jorge Rossero Air Liquide