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J.M. Karam President & CEO MEMSCAP Phone: +33 4 76 52 55 80 Fax: +33 4 76 52 55 81 Email: Jean-Michel.Karam@memscap.com
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Slide 2 J. M. KaramCompany Confidential SpecificationsArchitectureOptimization Schematic Capture Behavioral Simulation Design Centering Automatic Layout Generation DRC Etching Verification Cross-Section Viewing 3D Viewing FEM/BEM Process Variations
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Slide 3 J. M. KaramCompany Confidential SpecificationsArchitectureOptimization FEM/BEM Analysis Behavioral Modeling Behavioral Simulation Layout Generation DRC Etching Verification Cross-Section Viewing 3D Viewing Design Centering Full System Functionality Process Variations
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Slide 4 J. M. KaramCompany Confidential Schematic Capture (e.g. DA) Schematic Capture (e.g. DA) Mixed-Technology Simulator (e.g. Continuum/Eldo) Mixed-Technology Simulator (e.g. Continuum/Eldo) Place&Route [Layout Tool] (e.g. IC Station) Place&Route [Layout Tool] (e.g. IC Station) MEMS HDL-A/ VHDL-AMS Library MEMS HDL-A/ VHDL-AMS Library Layout Generators Layout Generators Technology Files Technology Files FEM to HDL-A Translator FEM to HDL-A Translator DRC Cross-Section Viewer Cross-Section Viewer Etching Verification Etching Verification Result Interface Result Interface Field Solvers (FEM, etc.) ANSYS Device Designer System Designer Optimization & Manufacturing Yield Management Tools Layout to 3D Solid-Model Layout to 3D Solid-Model Material Data Base Material Data Base
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Slide 5 J. M. KaramCompany Confidential Generic : VULCAIN TM Customizable by the User to the targeted process technology Seamless Design Flow: from Front-End to Back-End Anisotropic & Sacrificial Etching Simulation Multi-Segment, Multi-Angle Cross-Section Viewer Layout to/from 3D Solid-Model Generator EDD TM -Mesh : FEM to HDL-A Translator Foundry Modules : KANAGA TM [MCNC/Cronos] More than 75 Device Generators !
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Slide 6 J. M. KaramCompany Confidential MEMS HDL-A Model Schematic Symbol Layout Generator Building Block Level Device Level Generic FEM Validated Characterized Level 2 Level 1
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Slide 7 J. M. KaramCompany Confidential Algorithms : Monte Carlo & Surface Response Methods Customizable for any MEMS Process Extract Data from Process of Critical Monitors Build Statistical Model Behavioral Simulation Considering Process Variations Design Centering
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Slide 8 J. M. KaramCompany Confidential
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Slide 9 J. M. KaramCompany Confidential
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Slide 10 J. M. KaramCompany Confidential
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Slide 11 J. M. KaramCompany Confidential Ensure Schematic Driven Layout Generators Coupled to System Level Model Improve Productivity at Layout Custom Design Device Generators Functions (Non-Manhattan Shapes) Building Blocks Device Level
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Slide 12 J. M. KaramCompany Confidential
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Slide 13 J. M. KaramCompany Confidential
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Slide 14 J. M. KaramCompany Confidential Anisotropic Etching SimulationSacrificial Etching Simulation
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Slide 15 J. M. KaramCompany Confidential
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Slide 16 J. M. KaramCompany Confidential Layout Area Selection o Layout FEM o 3D Viewer (VRML, etc.)
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Slide 17 J. M. KaramCompany Confidential
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Slide 18 J. M. KaramCompany Confidential
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