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Published byEric McNally Modified over 11 years ago
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ITRS Summer Conference 2010 USA 1 Work in Progress: Not for Distribution ESH ITWG Jim Jewett Environmental, Safety and Health Chapter ITRS 2010 Hans-Peter Bipp – Infineon Middle, C.Y. Huang – TSMC Shigehito Ibuka - TEL Jim Jewett – Intel Leo Kenny - Intel Joey Lu - ITRI Mike Mocella – DuPont Takayuki Ohgoshi – Renesas Ron Remke - ISMI
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ITRS Summer Conference 2010 USA 2 Work in Progress: Not for Distribution AGENDA Changes to 2010 Tables Roadmap challenges for 2011 450mm Preliminary Evaluation Climate Change Requirements (Energy)
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ITRS Summer Conference 2010 USA 3 Work in Progress: Not for Distribution 2010 Changes Focus 2010 efforts on major challenges driving changes to 2011 roadmap rewrite –Minimize 2010 table revisions (some simple word changes to add clarity to intent of requirements) –Correct error found in metric definition so it matches value in technology requirements
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ITRS Summer Conference 2010 USA 4 Work in Progress: Not for Distribution 2011 Roadmap Challenge #1 Increase in the polarization of public/government policy expectations vs. future technology needs Industry increasingly dependent on key process/product substances –Dependence on specific materials for critical applications –New materials for functional scaling are often unique New Paradigm – Gov must approve use –Threatening to three technology areas Disclosure of IP Addition of time Reduce Flexibility
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ITRS Summer Conference 2010 USA 5 Work in Progress: Not for Distribution 2011 Roadmap Challenge #2 Specification of technology requirements in non- quantifiable or non-data supported terms Some data is not quantifiable in terms of the need (objective being defined) Data do not exist, are not representative or do not have granularity for defining a technical objective
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ITRS Summer Conference 2010 USA 6 Work in Progress: Not for Distribution Improvement in process chemical utilization (% of 2005 baseline) Importan t 90807550 Reduce PFC emission Critical 10% absolute reduction from 1995 baseline by 2010 as agreed to by the World Semiconductor Council (WSC) Maintain 10% absolute reduction from 1995 baseline Liquid and solid waste reduction (% of 2007 baseline) Importan t 90807550 Non-quantifiable Data Problem
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ITRS Summer Conference 2010 USA 7 Work in Progress: Not for Distribution Non-data Supported Problem Water Consumption Surface preparation UPW use (% of 2005 baseline) Important 90807550 Tool UPW usage (% of 2005 baseline) Important 90807550
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ITRS Summer Conference 2010 USA 8 Work in Progress: Not for Distribution Moving Forward in 2011 Roadmap Drive Principled research rather than process oriented research where work is important but precise technical definition is not Will continue to drive research in important ESH areas Will allow the continuous improvement element to be retained Provides a framework to manage the basic framework on chemical hazard/risk Will move into more quantifiable technology requirements as research moves forward Retain quantitative measures where we are able Evaluate chemical elements where we can technically mitigate the challenges to technology needs Define chemicals/chemical classes which are important for the future ID Insertion into technology Establish research on product risk
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ITRS Summer Conference 2010 USA 9 Work in Progress: Not for Distribution 450mm Preliminary ESH program evaluation, 450mm does not directly impact the ITRS ESH technology requirements –450mm (current program for energy, water and emissions) will take advantage of existing solutions (implementation vs. invention) –450mm will be able to incorporate results of current 300mm work (e.g. – idle mode, chemical utilization) –Contingent upon better understanding of 450mm technology as we get closer
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ITRS Summer Conference 2010 USA 10 Work in Progress: Not for Distribution Footnote on Carbon Focus ITRS Goals on Technology Energy Efficiency Electricity generation sources are primary factor – not technology design Carbon footprint methodologies are in the embryonic stage –quality data is not yet available Collaborate very closely with Factory Integration thrust to make sure we get it right
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