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Published byChase Thomas Modified over 11 years ago
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ESH ITWG April 7, 2006 Vaals, Netherlands Summary of Environmental, Health and Safety Chapter ITRS 2006
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2/5/2014 8:17 PM File name and path go here. 2 Agenda 2005 (Seoul) Summary Technical Work –Cross-thrust Analysis –2006 Overall ESH needs –Objectives and work assignments for July meeting Have Fun at the ITRS IRC Issues?
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2/5/2014 8:17 PM File name and path go here. 3 2006 ITRS Update ESH Focus Issues-1 Chemicals – MATERIAL CHOICE Material in devices vs precursor/starting materials ALD/MOCVD/PVD Process By-Products (e.g. – RuO 4, Al(CH 3 ) 3 ) Pb-Free Roadmap Materials for Manufacturing Only Non-aqueous immersion fluids PFOS moving to PFAS/PFOA ERM Proposed ERM Table would map ERDs material classes ESH assess for future potential risks (of each class) Nano Infrastructure Dialog (e.g. – metrology) Energy EUV (Lithography) Energy Goals (Interconnect) Who Owns Setting/Driving Energy Reduction Needs Sleep State Technology (Factory Integration) Green Fab Definition (Factory Integration)
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2/5/2014 8:17 PM File name and path go here. 4 2006 ITRS Update ESH Focus Issues-2 Recycle Systems Chemical Definition of Recycle, Reuse, Reclaim Conflict with technology performance Energy penalty due to dilute chemicals Water Conflict with technology performance
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2/5/2014 8:17 PM File name and path go here. 5 ESH Chapter ITWG Attendees ESIA – Shane Harte (ESIA) - Francesca Illuzzi (ST Microelectronics) - Harry Thewissen (Philips) JSIA –- Shigehito Ibuka (TEL) - Takayuki Oogoshi (NEC Electronics) - Tetsu Tomine (Seiko-Epson) SIA – Jim Jewett (Intel) - Walter Worth (Sematech)
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