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© Digital Integrated Circuits 2nd Devices Digital Integrated Circuits A Design Perspective The Devices Jan M. Rabaey Anantha Chandrakasan Borivoje Nikolic July 30, 2002
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© Digital Integrated Circuits 2nd Devices Goal of this chapter Present intuitive understanding of device operation Introduction of basic device equations Introduction of models for manual analysis Introduction of models for SPICE simulation Analysis of secondary and deep-sub-micron effects Future trends
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© Digital Integrated Circuits 2nd Devices The Diode Mostly occurring as parasitic element in Digital ICs
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© Digital Integrated Circuits 2nd Devices Depletion Region
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© Digital Integrated Circuits 2nd Devices Depletion Region
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© Digital Integrated Circuits 2nd Devices Depletion Region
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© Digital Integrated Circuits 2nd Devices Forward Bias Typically avoided in Digital ICs Wp Wn
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© Digital Integrated Circuits 2nd Devices Forward Bias
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© Digital Integrated Circuits 2nd Devices Forward Bias
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© Digital Integrated Circuits 2nd Devices Reverse Bias The Dominant Operation Mode
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© Digital Integrated Circuits 2nd Devices Diode Current
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© Digital Integrated Circuits 2nd Devices Models for Manual Analysis
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© Digital Integrated Circuits 2nd Devices Junction Capacitance
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© Digital Integrated Circuits 2nd Devices Diffusion Capacitance
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© Digital Integrated Circuits 2nd Devices Secondary Effects –25.0–15.0–5.05.0 V D (V) –0.1 I D ( A ) 0.1 0 0 Avalanche Breakdown
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© Digital Integrated Circuits 2nd Devices Diode Model
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© Digital Integrated Circuits 2nd Devices SPICE Parameters
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© Digital Integrated Circuits 2nd Devices What is a Transistor? A Switch! |V GS | An MOS Transistor
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© Digital Integrated Circuits 2nd Devices The MOS Transistor Polysilicon Aluminum
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© Digital Integrated Circuits 2nd Devices MOS Transistors - Types and Symbols D S G D S G G S DD S G NMOS Enhancement NMOS PMOS Depletion Enhancement B NMOS with Bulk Contact
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© Digital Integrated Circuits 2nd Devices Basic Concepts
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© Digital Integrated Circuits 2nd Devices Depletion of MOS
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© Digital Integrated Circuits 2nd Devices Creating Inversion Layer
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© Digital Integrated Circuits 2nd Devices Ideal Threshold Voltage
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© Digital Integrated Circuits 2nd Devices More Realistic Vto
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© Digital Integrated Circuits 2nd Devices Even More Realistic Vto Threshold adjustment with ion dose Di
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© Digital Integrated Circuits 2nd Devices Body Effect
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© Digital Integrated Circuits 2nd Devices MOSFET Operation
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© Digital Integrated Circuits 2nd Devices MOSFET GCA Analysis
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© Digital Integrated Circuits 2nd Devices MOSFET GCA Analysis
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© Digital Integrated Circuits 2nd Devices MOSFET GCA Analysis
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© Digital Integrated Circuits 2nd Devices Non saturation mode
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© Digital Integrated Circuits 2nd Devices Saturation Mode Find the maximum in Id equation
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© Digital Integrated Circuits 2nd Devices Saturation Mode
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© Digital Integrated Circuits 2nd Devices Channel Length Modulation
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© Digital Integrated Circuits 2nd Devices Saturation Mode (Channel Length Modulation)
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© Digital Integrated Circuits 2nd Devices The Threshold Voltage
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© Digital Integrated Circuits 2nd Devices The Body Effect
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© Digital Integrated Circuits 2nd Devices Body Bias
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© Digital Integrated Circuits 2nd Devices Current-Voltage Relations A good ol’ transistor Quadratic Relationship 00.511.522.5 0 1 2 3 4 5 6 x 10 -4 V DS (V) I D (A) VGS= 2.5 V VGS= 2.0 V VGS= 1.5 V VGS= 1.0 V ResistiveSaturation V DS = V GS - V T
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© Digital Integrated Circuits 2nd Devices Current-Voltage Relations Long-Channel Device
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© Digital Integrated Circuits 2nd Devices A model for manual analysis
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© Digital Integrated Circuits 2nd Devices Current-Voltage Relations The Deep-Submicron Era Linear Relationship -4 V DS (V) 00.511.522.5 0 0.5 1 1.5 2 2.5 x 10 I D (A) VGS= 2.5 V VGS= 2.0 V VGS= 1.5 V VGS= 1.0 V Early Saturation
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© Digital Integrated Circuits 2nd Devices Velocity Saturation (V/µm) c = 1.5 n ( m / s ) sat = 10 5 Constant mobility (slope = µ) Constant velocity
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© Digital Integrated Circuits 2nd Devices Perspective I D Long-channel device Short-channel device V DS V DSAT V GS - V T V GS = V DD
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© Digital Integrated Circuits 2nd Devices I D versus V GS 00.511.522.5 0 1 2 3 4 5 6 x 10 -4 V GS (V) I D (A) 00.511.522.5 0 0.5 1 1.5 2 2.5 x 10 -4 V GS (V) I D (A) quadratic linear Long Channel Short Channel
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© Digital Integrated Circuits 2nd Devices I D versus V DS -4 V DS (V) 00.511.522.5 0 0.5 1 1.5 2 2.5 x 10 I D (A) VGS= 2.5 V VGS= 2.0 V VGS= 1.5 V VGS= 1.0 V 00.511.522.5 0 1 2 3 4 5 6 x 10 -4 V DS (V) I D (A) VGS= 2.5 V VGS= 2.0 V VGS= 1.5 V VGS= 1.0 V ResistiveSaturation V DS = V GS - V T Long ChannelShort Channel
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© Digital Integrated Circuits 2nd Devices Simple Model versus SPICE V DS (V) I D (A) Velocity Saturated Linear Saturated V DSAT =V GT V DS =V DSAT V DS =V GT
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© Digital Integrated Circuits 2nd Devices A PMOS Transistor -2.5-2-1.5-0.50 -0.8 -0.6 -0.4 -0.2 0 x 10 -4 V DS (V) I D (A) Assume all variables Negative relative to Vdd! VGS = -1.0V VGS = -1.5V VGS = -2.0V VGS = -2.5V
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© Digital Integrated Circuits 2nd Devices Transistor Model for Manual Analysis
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© Digital Integrated Circuits 2nd Devices MOS Capacitances Dynamic Behavior
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© Digital Integrated Circuits 2nd Devices Dynamic Behavior of MOS Transistor
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© Digital Integrated Circuits 2nd Devices The Gate Capacitance t ox n + n + Cross section L Gate oxide x d x d L d Polysilicon gate Top view Gate-bulk overlap Source n + Drain n + W SPICE Parameter: CGSO, CGDO = Xd*Cox
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© Digital Integrated Circuits 2nd Devices Gate Capacitance Cut-off ResistiveSaturation Most important regions in digital design: saturation and cut-off For speed considerations, assume worst-case scenario = W*L*Cox
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© Digital Integrated Circuits 2nd Devices Gate Capacitance Capacitance as a function of VGS (with VDS = 0) Capacitance as a function of the degree of saturation
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© Digital Integrated Circuits 2nd Devices Measuring the Gate Cap -1.5 -1 -0.50 3 4 5 6 7 8 9 10 x 10 -16 2 V GS (V) V GS Gate Capacitance (F) 0.511.52 -2 I
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© Digital Integrated Circuits 2nd Devices Diffusion Capacitance Bottom Side wall Channel Source N D Channel-stop implant N A + SubstrateN A W x j L S
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© Digital Integrated Circuits 2nd Devices Junction Capacitance
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© Digital Integrated Circuits 2nd Devices Capacitances in 0.25 m CMOS process
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© Digital Integrated Circuits 2nd Devices Capacitances in 0.5 m CMOS process NMOSFETPMOSFET K19.6 uA/V 2 5.4 uA/V 2 VTO0.74 V-0.74 V g0.6 l0.06 V -1 0.19 V -1 Xd (Under Diffusion)6 nm1 nm NSUB1.3 x 10^(16) cm -3 4.8 x 10^(15) cm -3 COX1.1 x 10^(-3) F/m CGDO = CGSO9.6 x 10^(-12) F/m1.7 x 10^(-12) F/m CJ2.8 x 10^(-4) F/m 2 3.0 x 10^(-4) F/m 2 CJSW1.7 x 10^(-10) F/m2.6 x 10^(-10) F/m
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© Digital Integrated Circuits 2nd Devices The Sub-Micron MOS Transistor Threshold Variations Subthreshold Conduction Parasitic Resistances
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© Digital Integrated Circuits 2nd Devices Threshold Variations V T L Long-channel threshold LowV DS threshold Threshold as a function of the length (for lowV DS ) Drain-induced barrier lowering (for lowL) V DS V T
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© Digital Integrated Circuits 2nd Devices Sub-Threshold Conduction 00.511.522.5 10 -12 10 -10 10 -8 10 -6 10 -4 10 -2 V GS (V) I D (A) VTVT Linear Exponential Quadratic Typical values for S: 60.. 100 mV/decade The Slope Factor S is DV GS for I D2 /I D1 =10
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© Digital Integrated Circuits 2nd Devices Sub-Threshold I D vs V GS V DS from 0 to 0.5V
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© Digital Integrated Circuits 2nd Devices Sub-Threshold I D vs V DS V GS from 0 to 0.3V
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© Digital Integrated Circuits 2nd Devices Summary of MOSFET Operating Regions Strong Inversion V GS > V T Linear (Resistive) V DS < V DSAT Saturated (Constant Current) V DS V DSAT Weak Inversion (Sub-Threshold) V GS V T Exponential in V GS with linear V DS dependence
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© Digital Integrated Circuits 2nd Devices Parasitic Resistances
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© Digital Integrated Circuits 2nd Devices Latch-up
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© Digital Integrated Circuits 2nd Devices Future Perspectives 25 nm FINFET MOS transistor
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