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Published byMarilynn Ball Modified over 9 years ago
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Dahee Kim (Ewha womans university) for MPC-EX collaboration TEST OF MINI-PAD SILICON SENSOR FOR PHENIX MPC-EX
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Contents We report test results of prototype silicon sensors for PHENIX MPC-EX. We describe basic theory and suggest key tests for silicon sensor. Suggested and reported key tests are CV characteristics IV characteristics & Electric circuitry test
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Basic theory Operation of PIN sensor. Electron-hole generation & depletion region.
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Capacitance Relation to depletion thickness. 17.0pF Full depletion region is about 23.5pF
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Simulation about CV characteristic
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Capacitance (V) bias V 020406080100120140160180 ) - 2 ( F 2 1 / C 0 2000 4000 6000 8000 10000 18 10 -2 F V 19 = 5.09 x 10 2 A 2 Fu ll d ep let ion v ol tag e
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Scaling with area on test pattern.
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Current Shockley diode equation(Ideal case) Simplifying idealization (drift, diffusion, thermal recombination- generation). Not considered : Surface leakage current, high injection, defect etc. With high injection(large I ), at 300K
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Forward bias current (V) bias V 0.20.40.6 I ( A ) -7 10 -6 10 -5 10 -4 10 -3 10 -2 10 YS11 test pattern, Forward-bias characteristics T V V e 0 I=I T 2V V e 0 I=I Ideal region High injection region S e r i e s r e s i s t a n c e d o m i n a t e d
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Reverse bias current(Leakage current) Source of leakage current Volume term Thermal recombination-generation leakage current Defect Surface leakage current Radiation(include light and cosmic ray etc..)
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Guard ring structure PADs of Sensor Bonding PADs Bias Guardring Floating Guardring (3 layer structure) Edge Rounding
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Effect of Bias Guard Ring YS04_L real sensor
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Effect of Dicing Before dicing Floating Guard Ring YS09_L real sensor After dicing
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Electric circuit test We measured resistance between neighboring channels. Small fraction of them had short. Current yield ~ 30%. Statistics suggest the short is between metal traces. Stringent metal etching process is expected to cure the problem. 30 1.5 cm 3 cm 1 234 Cut line 6 cm Electric short happens between neighboring channels. The short frequency is proportional to trace overlap.
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Summary We measured full depletion voltage for 425μm wafer to be 35V which corresponds to resistivity ~15,000 Ωcm. No breakdown is observed until the reverse bias voltage of 250V. We observed low leakage current less than 1μA for the whole sensor of 6 x 6 cm. We identified a small number of shorts between neighboring channels and attribute the problem to close metal traces. We propose further etching process for metal layer and/or increased space between metal traces.
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