1. Click mouse or hit space bar to advance slides All slides property of Cronos, all rights reserved Silicon Substrate Add nitride

2. Click mouse or hit space bar to advance slides All slides property of Cronos, all rights reserved Silicon Substrate Add Poly0

3. Click mouse or hit space bar to advance slides All slides property of Cronos, all rights reserved Silicon Substrate Patterning through 1st level mask (Poly0) using Photolithography Photoresist Patterned Photoresist

4. Click mouse or hit space bar to advance slides All slides property of Cronos, all rights reserved Silicon Substrate Patterned Photoresist Removal of Unwanted Poly0 using Reactive Ion Etching

5. Click mouse or hit space bar to advance slides All slides property of Cronos, all rights reserved Silicon Substrate 1st Oxide Deposition using LPCVD

6. Click mouse or hit space bar to advance slides All slides property of Cronos, all rights reserved Silicon Substrate Patterning through 2nd level mask (Dimple) using Photolithography... Photoresist and Deep RIE

7. Click mouse or hit space bar to advance slides All slides property of Cronos, all rights reserved Silicon Substrate Patterning through 3rd level mask (Anchor) using Photolithography Photoresist and Deep RIE

8. Click mouse or hit space bar to advance slides All slides property of Cronos, all rights reserved Silicon Substrate Blanket un-doped polysilicon deposition(Poly1) using LPCVD... followed by PSG deposition and annealing

9. Click mouse or hit space bar to advance slides All slides property of Cronos, all rights reserved Silicon Substrate Patterning through 4th level mask (Poly1) using Photolithography... Photoresist and Deep RIE

10. Click mouse or hit space bar to advance slides All slides property of Cronos, all rights reserved Deposition of 2nd Oxide Layer Silicon Substrate

11. Click mouse or hit space bar to advance slides All slides property of Cronos, all rights reserved Patterning through 5th level mask using photolithography and deep RIE Silicon Substrate

12. Click mouse or hit space bar to advance slides All slides property of Cronos, all rights reserved Patterning through 6th level mask using photolithography and deep RIE Silicon Substrate

13. Click mouse or hit space bar to advance slides All slides property of Cronos, all rights reserved Deposition of undoped polysilicon, Silicon Substrate followed by PSG hardmask layer, then anneal

14. Click mouse or hit space bar to advance slides All slides property of Cronos, all rights reserved Patterning through 7th level mask using photolithography and deep RIE Silicon Substrate

15. Click mouse or hit space bar to advance slides All slides property of Cronos, all rights reserved Patterning through 8th level mask using photolithography and liftoff, followed by removal of unwanted resist and metal in solvent bath Silicon Substrate

16. Click mouse or hit space bar to advance slides All slides property of Cronos, all rights reserved Release of structures using HF Silicon Substrate