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Overview and Introduction to Nanotechnology: What, Why and How Overview and Introduction to Nanotechnology: What, Why and How Mark Tuominen Professor of.

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Presentation on theme: "Overview and Introduction to Nanotechnology: What, Why and How Overview and Introduction to Nanotechnology: What, Why and How Mark Tuominen Professor of."— Presentation transcript:

1 Overview and Introduction to Nanotechnology: What, Why and How Overview and Introduction to Nanotechnology: What, Why and How Mark Tuominen Professor of Physics Jonathan Rothstein Professor of Mechanical Eng.

2 Next Generation Science Standards (NGSS): Three Pillars Disciplinary Core Ideas Science and Engineering Practices Crosscutting Concepts

3 Nanotechnology The biggest science initiative since the Apollo program

4 Nanotechnology Nanotechnology is the understanding and control of matter at dimensions of roughly 1 to 100 nanometers, where unique phenomena enable novel applications. 1 nanometer = 1 billionth of a meter = 1 x 10 -9 m nano.gov

5 Why do we want to make things at the nanoscale? To make better products: smaller, cheaper, faster, more effective and help sustainability. (Electronics, catalysts, water purification, solar cells, coatings, medical diagnostics & therapy, and more.) To discover completely new physical phenomena to science and technology. (Quantum behavior and other effects.)

6 How small are nanostructures? Single Hair Width = 0.1 mm = 100 micrometers = 100,000 nanometers !

7 Smaller still Hair. DNA 3 nanometers 6,000 nanometers 100,000 nanometers 10 nm objects made by guided self-assembly

8 Red blood cells (~7-8  m) Things Natural Things Manmade Fly ash ~ 10-20  m Head of a pin 1-2 mm Quantum corral of 48 iron atoms on copper surface positioned one at a time with an STM tip Corral diameter 14 nm Human hair ~ 60-120  m wide Ant ~ 5 mm Dust mite 200  m ATP synthase ~10 nm diameter Nanotube electrode Carbon nanotube ~1.3 nm diameter The Challenge Fabricate and combine nanoscale building blocks to make useful devices, e.g., a photosynthetic reaction center with integral semiconductor storage. Microworl d 0.1 nm 1 nanometer (nm) 0.01  m 10 nm 0.1  m 100 nm 1 micrometer (  m) 0.01 mm 10  m 0.1 mm 100  m 1 millimeter (mm) 1 cm 10 mm 10 -2 m 10 -3 m 10 -4 m 10 -5 m 10 -6 m 10 -7 m 10 -8 m 10 -9 m 10 -10 m Visible Nanoworl d 1,000 nanometers = Infrared Ultraviolet Microwave Soft x-ray 1,000,000 nanometers = Zone plate x-ray “lens” Outer ring spacing ~35 nm Office of Basic Energy Sciences Office of Science, U.S. DOE Version 05-26-06, pmd The Scale of Things – Nanometers and More MicroElectroMechanical (MEMS) devices 10 -100  m wide Red blood cells Pollen grain Carbon buckyball ~1 nm diameter Self-assembled, Nature-inspired structure Many 10s of nm Atoms of silicon spacing 0.078 nm DNA ~2-1/2 nm diameter

9 Types of Nanostructures and How They Are Made

10 "Nanostructures" Nano-objectsNanostructured Materials nanoscale outer dimensions nanoscale internal structure Nanoscale Devices and Systems Integrated nano-objects and materials "nanoparticle" "nanorod" "nanofilm" "nanotube" and more

11 Making Nanostructures: Nanomanufacturing "Top down" versus "bottom up" methods Lithography Deposition Etching Machining Chemical Self-Assembly

12 Some nanomaterials are just alternate arrangements of well-known materials Carbon materials 2010 Nobel Prize!

13 A nanofilm method: Thermal Evaporation Vaporization or sublimation of a heated material onto a substrate in a vacuum chamber vacuum ~10 -7 torr sample source film vacuum pump QCM vapor heating source Pressure is held low to prevent contamination! Au, Cr, Al, Ag, Cu, SiO, others There are many other thin film manufacturing techniques

14 Patterning: Photolithography substrate process recipe spin on resist resist expose mask (reticle) develop deposit applyspinbake spin coating exposed unexposed "scission" liftoff etch narrow line narrow trench

15 Patterning: Imprint Lithography Mold Template Polymer or Prepolymer Substrate Imprint Pressure Heat or Cure Release Thermal Imprint Lithography –Emboss pattern into thermoplastic or thermoset with heating UV-Assisted Imprint Lithography –Curing polymer while in contact with hard, transparent mold

16 Limits of Lithography Complex devices need to be patterned several times  Takes time and is expensive Limited by wavelength of light  Deep UV ~ 30nm features Can use electrons instead  1nm features possible  MUCH slower than optical IBM - Copper Wiring On a Computer Chip

17 Self Assembly

18 Immiscibility and phase separation: Driven by intermolecular interactions Olive oil Balsamic vinegar Polymer mixture Thermodynamically driven

19 SELF ASSEMBLY with DIBLOCK COPOLYMERS Block “A” Block “B” 10% A 30% A 50% A 70% A 90% A ~10 nm Ordered Phases PMMA PS Scale set by molecular size

20 nanoporous template Nanomagnets in a Self-Assembled Polymer Mask 1x10 12 magnets/in 2 Data Storage......and More

21 A Message for Students - Nanotechnology is changing practically every part of our lives. It is a field for people who want to solve technological challenges facing societies across the world. - There are well-paying, interesting jobs – technician, engineer, scientist, manufacturing, sales, and others.


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