1. VTS Sputter Roll Coater

2. VTS’s Sputter Roll Coater
Introduction
VTS’s Web/Roll Systems for the Converting Industry are individually
designed to meet each customer’s specific requirements.
The system presented in this brochure allows the user to develop
a process using state-of-the-art components and then go into
production.
VTS’s multi-process high vacuum Web/Roll Coating system is designed
to coat Polyimide Film, Mylar, foil and other thin plastic or metallic materials
stored in continuous roll form.
Typical process stations within the high vacuum chamber can include
sputter sources, electron beam guns, thermal sources, substrate heat,
ion beam sources and Plasma Process Bar.

3. AWC-550 Sputter Roll Coater
Product Information
Technology
By AWC-550, metals will be deposited to one side of the film to form a multi- layer at high rate Ion beam source is equipped with gas inlet system for argon and reactive gases.
Equipment Technique Multi-Chamber-System consisting of chambers for winding, pretreatment, coating, intermediate pumping
One coating drum to cool the film during the coating process
Cooling/heating equipment for coating drum
Pump equipment for short pump down with turbomolecular pumps
Pre-treatment by Ion beam source
Up to four standard DC magnetrons for metallic sputter processes
Electronically controlled winding system with 3 driving motors
Technical Data
Substrate Material Plastic film (PET, PI, etc.)
Roll diameter max. 380mm
Width up to 550 mm Thickness ㎛ to 200㎛
Film Speed to 5 M/min

4. Linear Ion Beam Source
Product Information
VTS’s Linear Ion Beam Source Features / Benefits
No Filaments or Grids
Truly production Worthy-low maintenance, no consumables, low cost
Reactive gas compatible - I.e.100% oxygen Low temperature
Operates at Magnetron Pressures(0.1-5mTorr)
Size Free
No need for multiple power supplies-hence easy integration
High Energy
High Current Density
Stability of Beam Uniformity
Current Density Distribution Profile

5. DC magnetrons Sputter Source
Product Information
VTS’s Linear Sputter Source Features / Benefits
Truly production Worthy-low maintenance, no consumables, low cost
Low temperature
Operates at Magnetron Pressures(0.8- 5mTorr)
Size Free
High Power compatible
High Deposition Rate
Stability of Coating Uniformity
㎛/min
Power vs Deposition Rate Å
Position vs Deposition Profile

6. PI film Electro- Plating Patterning VTS’s Technical Data for FCCL
Fine Pitch
Polyimide Film
Copper
PI film
Tie
layer
Deposition
Pretreatment
Electro-
Plating
Patterning
Web coating
PRODUCTION PROCESS OF FCCL

7. VTS’s Technical Data for FCCL
Surface Modification of Polyimide film by ATEC’s Linear Ion Beam Source
Wetting angle of polyimide with various
Doses by irradiated at ions
Surface energy of polyimide with various
Doses by irradiated at ions

8. VTS’s Technical Data for FCCL
Surface Modification of Polyimide by ATEC’s Linear Ion Beam Source
Low Current Density
High Current Density
Wetting angle of polyimide with different ion current by irradiated at ions
Adhesion strength with different gases
by irradiated at ions

9. VTS’s Technical Data for FCCL
XPS Data of modified polyimide film by Ion Beam Source
Schematic drawing of the polymeric repeat unit
of PMDAODA.
Binding Energy (eV)
XPS spectra of O 1s, N 1s, and C 1s from as-received PMDA-ODA polyimide after peak deconvolution
Binding Energy (eV)
XPS spectra of O 1s, N 1s, and C 1s from PMDA-ODA
polyimide after irradiation by linear ion beam source.

10. VTS’s Technical Data for FCCL
SAM Data of modified polyimide film by Ion Beam Source
By Gas A
Raw Film
By Gas A + C
By Gas C

11. VTS’s Technical Data for FCCL
Surface Modification of Polyimide film by Ion Source
Peel strength with various doses by
irradiated at ions
Peel strength with various doses
by irradiated at ions

12. VTS’s Technical Data for FCCL
Curing Test (150℃, 168h)
Cu Thickness vs Peel Strength
㎏f/㎝ ㎛ 2 4 6 8 10 12 14 16 18 20
0.0
0.2
0.4
0.6
0.8
1.0
1.2
Peel Strength ( )
Cu Thickness ( )
Peel strength with various doses by
irradiated at ions

13. VTS’s Technical Data for FCCL
Chemical Test
Test Condition
Sample Width : 3 ㎜
Sample Position : MD C
PI Thickness : 38 ㎛
Cu Thickness : 9 ㎛
Peeling mode : vertical(90˚)
Peeling Speed : 50 ㎜ / min
Mean : kgf/cm
원자재 표면
Normal Temperature
Mean : kgf/cm
Mean : kgf/cm
HCL Test
By Gas C
By Gas A + C
KOH Test

14. Conclusion VTS’s Web/Roll Systems : State-of-the-art Equipment
VTS’s Linear Ion Beam Source : High Current Density
Stability of Beam Uniformity
Size Free
VTS’s Linear DC Magnetron Sputter Source : High Deposition Rate
Stability of Coating Uniformity
Surface Modification of Pl by Gas C Ion : High Surface Energy
Fast Surface Modification
High Peel Strength
Ion Source of High Current Density : High Surface Energy
Curing Test : 0.32 kgf/㎝
Chemical Test : 0.78 kgf/㎝
원자재 표면
By Gas A
By Gas A + C
By Gas C