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Chap. 41: Conduction of electricity in solids Hyun-Woo Lee
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41-1 What Is Physics? Q: Why certain materials conduct electricity? Q: Why certain materials do NOT conduct electricity? Solid material Many many electrons and atoms Many many electrons and atoms Solid state physics Application of quantum physics to solids Application of quantum physics to solids
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41-2 Electrical Properties of Solids Crystalline solids Lattice structure Lattice structure Repetition of unit cellsRepetition of unit cells Classification criteria Resistivity at room temperature ( m) Resistivity at room temperature ( m) Temperature coefficient of resistivity (K -1 ) Temperature coefficient of resistivity (K -1 ) Number density of charge carriers n (m -3 ) Number density of charge carriers n (m -3 ) Can be found from Hall effect measurementCan be found from Hall effect measurement Metals, semiconductors, insulators Metals, semiconductors, insulators
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Insulators, semiconductors & metals Insulators Extremely large Extremely large Ex: Diamond diamond / copper ~10 24 Ex: Diamond diamond / copper ~10 24 Semiconductors vs Metals insulator >> semiconductor >> metal insulator >> semiconductor >> metal silicon =3 10 3 m, copper =2 10 -8 m silicon =3 10 3 m, copper =2 10 -8 m semiconductor 0 semiconductor 0 silicon = -70 10 -3 K -1, Copper = +4 10 -3 K -1 silicon = -70 10 -3 K -1, Copper = +4 10 -3 K -1 n semiconductor << n metal n semiconductor << n metal n silicon =1 10 16 m -3, n copper =9 10 28 m -3n silicon =1 10 16 m -3, n copper =9 10 28 m -3
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41-3 Energy Levels in a Crystalline Solids Single atom (Ex: Cu Z =29) 1 s 2 2 s 2 2 p 6 3 s 2 3 p 6 3 d 10 4 s 1 1 s 2 2 s 2 2 p 6 3 s 2 3 p 6 3 d 10 4 s 1 Two atoms Tunneling between two atoms Tunneling between two atoms Three atoms More tunneling More tunneling
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Tunneling effects Two wells Level splitting into two levels Level splitting into two levels
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Tunneling effects in solids N ( ) wells Energy level splitting into N levels Energy level splitting into N levels Energy bands & energy gaps Energy bands & energy gaps
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41-4 Insulators No partially filled bands For a current to exist, Kinetic energy must increase Kinetic energy must increase Electrons must move to higher-energy levels Electrons must move to higher-energy levels Pauli exclusion principle Pauli exclusion principle Transition to filled state is prohibitedTransition to filled state is prohibited Energy gap (Ex: E g =5.5 eV in diamond) Energy gap (Ex: E g =5.5 eV in diamond) Large energy supply needed Large energy supply needed Current flow strongly suppressed Current flow strongly suppressed
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Thermal fluctuation effects Thermal excitations Finite probability to jump E g Finite probability to jump E g Probability P for the jump For E g =5.5 eV, T =300K For E g =5.5 eV, T =300K cf: # of electron in 1 cm 3 ~ 10 23cf: # of electron in 1 cm 3 ~ 10 23
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41-5 Metals Partially filled bands Easy to induce energy “jump” Easy to induce energy “jump” Fermi level E F Highest occupied level at T =0K Highest occupied level at T =0K Ex: E F =7.0 eV for copper Ex: E F =7.0 eV for copper Fermi speed v F Electron speed at E F Electron speed at E F Ex: v F =1.6 10 6 m/s for copper Ex: v F =1.6 10 6 m/s for copper No relaxation of v F due to Pauli exclusion principle No relaxation of v F due to Pauli exclusion principle
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How Many Conduction Electrons Are There? Number density n Ex: Magnesium w/ volume 2.00 10 -6 m 3 Bivalent Bivalent
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Conductivity Above Absolutely Zero Ex: T =1000 K kT =0.086 eV kT =0.086 eV cf: E F =7.0 eV in copper cf: E F =7.0 eV in copper # of charge carriers extremely insensitive to T
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41-6 Semiconductors No partially filled bands But small energy gap Ex: E g =1.1 eV for silicon Ex: E g =1.1 eV for silicon cf: E g =5.5 eV for diamond cf: E g =5.5 eV for diamond Valence band Highest filled band Highest filled band Conduction band Lowest vacant band Lowest vacant band
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Number Density of Charge Carriers Probability P for jump Charge carriers Electrons Electrons Conduction bandConduction band Holes Holes Valence bandValence band # of charge carriers extremely sensitive to T # of charge carriers extremely sensitive to T
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Motion of charge carriers Electrons in conduction band Holes in valence band Efficient description in terms of holes Efficient description in terms of holes Effective charge of hole: + e Effective charge of hole: + e E E
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Resistivity silicon / copper = 1.5 10 11 Classical estimation Difference between silicon and copper mainly from carrier density n Difference between silicon and copper mainly from carrier density n
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Temperature Coefficient of Resistivity : : : : Temperature dependence Classical estimation Classical estimation Semiconductor (Ex: silicon) n increases as T increases < 0 n increases as T increases < 0 Metal (Ex: copper) decreases as T increases > 0 decreases as T increases > 0
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More about metals
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How Many Quantum States Are There? Too many states to list all states Density of states N ( E ) N ( E ) dE : # of states between E and E + dE per volume N ( E ) dE : # of states between E and E + dE per volume Near lower edge of partially filled band Near lower edge of partially filled band
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How Many Quantum States Are There ? (continued) Ex: Metal w/ V =2 10 -9 m 3 at E =7 eV
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The Occupancy Probability P ( E ) Maxwell distribution Not applicable due to Pauli exclusion principle Not applicable due to Pauli exclusion principle Fermi-Dirac statistics At E=E F P ( E )=1/2 regardless of T P ( E )=1/2 regardless of T Useful way to define E F at T >0 Useful way to define E F at T >0
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How Many Occupied States Are There? Density of occupied states N 0 ( E ) N 0 ( E )= N ( E ) P ( E ) N 0 ( E )= N ( E ) P ( E )
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Calculating the Fermi Energy At T =0, Due to Pauli exclusion principle Due to Pauli exclusion principle With N ( E ) E 1/2 With N ( E ) E 1/2
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More about semiconductors
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41-7 Doped Semiconductors Doping Introducing a small number of replacement atoms (impurities) into semiconductor lattice Introducing a small number of replacement atoms (impurities) into semiconductor lattice ~ 1 out of 10 7 atoms replaced ~ 1 out of 10 7 atoms replaced
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n -Type Semiconductors Pure silicon: Si ( Z =14) 1 s 2 2 s 2 3 p 6 3 s 2 3 p 2 Valence number: 4 Valence number: 4 Doping by P ( Z =15, valence=5) One extra el. n(egative) -type One extra el. n(egative) -type 5th el. in the “conduction band” 5th el. in the “conduction band”
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Extra electron & proton w/o extra proton w/ extra proton Weakly bound donor levels Weakly bound donor levels
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At room temperature Thermal excitations E d =0.045 eV for phosphorous doping E d =0.045 eV for phosphorous doping cf: E g =1.1 eV cf: E g =1.1 eV Excitations from donor levels to conduction band much easier Excitations from donor levels to conduction band much easier Majority carriers Electrons in conduction band Electrons in conduction band Minority carriers Holes in valence band Holes in valence band
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Doping level Pure silicon # density of conduction el. at room temp # density of conduction el. at room temp (n 0 ) no-doping ~ 10 16 m -3(n 0 ) no-doping ~ 10 16 m -3 Q: Doping for ( n 0 ) doping =10 6 (n 0 ) no-doping ( n 0 ) doping = (n 0 ) no-doping + n P ( n 0 ) doping = (n 0 ) no-doping + n P n P 10 22 m -3 n P 10 22 m -3 cf: n Si 5 10 28 m -3 cf: n Si 5 10 28 m -3
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p -Type Semiconductors Doping by Al ( Z =13) One missing el p (ositive)-type One missing el p (ositive)-type Missing el in “valence band” Missing el in “valence band” w/ missing proton Weakly bound acceptor levels Weakly bound acceptor levels
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At room temperature Thermal excitations E d =0.067 eV for aluminium doping E d =0.067 eV for aluminium doping cf: E g =1.1 eV cf: E g =1.1 eV Excitations from valence band to acceptor levels much easier Excitations from valence band to acceptor levels much easier Majority carriers Holes in valence band Holes in valence band Minority carriers Electrons in conduction band Electrons in conduction band
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41-8 The p - n Junction Junction of p -type and n -type semicond. Upon contact, …(no bias yet) Junction plane
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Motions of the Majority Carriers Diffusion Diffusion current I diff Diffusion current I diff Space charge -e-e +e+e Depletion zone Contact potential difference V 0 I diff I diff = 0
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Motions of the Minority Carriers Minority carriers Drift current I drift Drift current I drift Space charge somewhat relaxed Space charge somewhat relaxed Majority & minority carriers Balance of I diff & I drift Balance of I diff & I drift I drift
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41-9 The Junction Rectifier I vs. V p - n junction as a rectifier AC DC conversion AC DC conversion
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Forward bias Reduce V 0 Reduce V 0 Narrower depletion zone
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Backward bias Enhance V 0 Enhance V 0 Wider depletion zone
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41-10 The Light-Emitting Diode (LED) LED Light emission from p - n junction Photon or lattice vibration Forward bias
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p - n junction as LED Forward biased p - n junction Photon wavelength Photon wavelength Commercial LEDs in visible range in visible range Ex: Gallium (valence 3) doped with arsenic (valence 5, 60%) and phosphorous (valence 5, 40%) atoms Ex: Gallium (valence 3) doped with arsenic (valence 5, 60%) and phosphorous (valence 5, 40%) atoms E g =1.8 eV (red color)E g =1.8 eV (red color)
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The Photo-Diode Photo-diode = (LED) -1 Photon Current Photon Current Ex: TV remote control Ex: TV remote control Remote control : LEDRemote control : LED Generate a certain sequence of infrared photons Generate a certain sequence of infrared photons TV : Photo-diodeTV : Photo-diode Photon detection Electric signal Photon detection Electric signal Photon-induced transition
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The Junction Laser Stimulated emission in p - n junction Junction laser Junction laser Ex: Laser head in compact disc (CD) playersEx: Laser head in compact disc (CD) players Mirror
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41-11 The Transistor Transistor Intentional control of on-off Intentional control of on-off Application: Amplifier Application: Amplifier FET (Field Effect Transistor) Integrated circuits Transistors Transistors Capacitors Capacitors Resistors etc. Resistors etc. Intel Pentium chip (w/ ~7 million transistors)
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MOSFET (Metal-Oxide-Semiconductor-FET) MOSFET High speed on-off High speed on-off ~500 nm in length ~500 nm in length Gate voltage V GS Negatively charge gate Negatively charge gate Repel el. in n -channel down into substrate Repel el. in n -channel down into substrate Wider depletion zone between p and n Wider depletion zone between p and n n -channel width reduced n -channel width reduced Larger resistance (off realized) Larger resistance (off realized)
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The End
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