Presentation is loading. Please wait.

Presentation is loading. Please wait.

Filtek™ LS Low Shrink Posterior Restorative System.

Similar presentations


Presentation on theme: "Filtek™ LS Low Shrink Posterior Restorative System."— Presentation transcript:

1 Filtek™ LS Low Shrink Posterior Restorative System

2  Less than 1% shrinkage 1  Reduced stress and improved marginal integrity  Extended operatory light stability  A remarkable 9 minutes of working time  Ideal handling  Non-sticky, easier manipulation during placement, and ideal sculptability  Silorane technology  Low shrinkage is achieved by using a novel ring-opening chemistry, called silorane.  Used with dedicated 3M™ ESPE™ LS System Adhesive  Available in 4 shades (A2, A3, B2, C2) with excellent chameleon effect 1 <1% volumetric shrinkage tested by bonded-disc method

3 Polymerization Stress vs. Shrinkage 0 5 10 15 20 0.5 % 1.0%1.5%2.0%2.5%3.0% Shrinkage (Vol. %) Polymerization Stress (MPa) Filtek™ LS Watts et al. Charisma™ Spectrum ® TPH ® Herculite™ XRV CeramX™ Grandio ® QuiXX™ Premise™ Tetric EvoCeram ® P60 Advantages Reduced polymerization shrinkage and stress can lower the risk of marginal staining, post-operative sensitivity, secondary caries, microleakage and debonding. Advantages Reduced polymerization shrinkage and stress can lower the risk of marginal staining, post-operative sensitivity, secondary caries, microleakage and debonding. Stress method: Bloman; shrinkage method: bonded-disc. Source: University of Manchester

4 Polymerization Stress Methacrylate ChemistrySilorane Chemistry Filtek™ LS Finite element analysis of polymerization stress. Source: University of Minnesota. High Stress Low Stress 50 QuiXX™

5 Operatory Light Stability Advantages  Increased working time  Ability to use operatory light directly  Improved visibility in the posterior can lead to better marginal adaptation  Flexibility and easy placement Method: ISO 4049, Source: 3M ESPE, internal data

6 Placement of Filtek™ LS Posterior Restorative 3M™ ESPE™ Filtek LS Self-Etch Primer  Apply with agitation for 15 sec  Air dry  Light cure for 10 seconds 3M™ ESPE™ LS System Adhesive Bond  Apply  Air thin if desired  Light cure for 10 seconds Filtek™ LS Restorative  Incremental placement is indicated; depth of cure is 2.5 mm  Excellent operatory light stability allows additional time for manipulation  Light-cure each increment as indicated (20 seconds for LED over 1000 mw/cm2)

7 Photos courtesy of Dr. Gabriel Krastl Clinical Results of Filtek™ LS Posterior Restorative

8 Filtek™ LS Low Shrink Posterior Restorative System  Filtek™ LS Posterior Restorative could help increase patient satisfaction, improve restorative success, and increase practice productivity  Two ways to try Filtek™ LS Posterior Restorative System Trial Kit (4901TK & 4902TK) Risk Free Try & Buy (4901TB & 4902TB)- Available 6/2008


Download ppt "Filtek™ LS Low Shrink Posterior Restorative System."

Similar presentations


Ads by Google