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1 nm MRI: Acquisition of a State-of-the-Art Aberration-Corrected Analytical Electron Microscope with Enhanced Atomic-Level Spectrometry and Low-Voltage.

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Presentation on theme: "1 nm MRI: Acquisition of a State-of-the-Art Aberration-Corrected Analytical Electron Microscope with Enhanced Atomic-Level Spectrometry and Low-Voltage."— Presentation transcript:

1 1 nm MRI: Acquisition of a State-of-the-Art Aberration-Corrected Analytical Electron Microscope with Enhanced Atomic-Level Spectrometry and Low-Voltage Performance Masashi Watanabe, Lehigh University, DMR 1040229 Intellectual Merit: Installation of the state-of-the-art aberration-corrected instrument At Lehigh University, we are now installing a new state-of-the-art aberration-corrected analytical electron microscope (ACAEM) for improved atomic-level analysis and enhanced low-voltage performance (Fig. 1). The selected instrument is a JEOL JEM-ARM200CF ACAEM with a cold field- emission gun, a CEOS aberration corrector for probe forming, the largest solid-angle X-ray energy dispersive spectrometer and the fastest available electron energy-loss spectrometer. It is funded by the NSF-MRI program This instrument can be operated in 200 to 60 kV range: the former condition is mainly for higher resolution imaging/chemical analysis and the latter is for characterization of beam sensitive materials, such as carbon-based materials and oxides. Figure 2 shows two initial images of Si taken to confirm resolution performance at (a) 200 and (b) 60 kV, respectively. Fig. 1 Fig. 2(a) (b) Fig. 1 The JEM-ARM200CF under installation at Lehigh. Fig. 2 Initial HAADF-STEM images taken (a) at 200 kV from the (112) Si projection, and (b) at 60 kV from the (110) Si projection. The image resolution reaches to 78 pm at 200 kV and 136 pm at 60 kV, respectively.

2 MRI: Acquisition of a State-of-the-Art Aberration-Corrected Analytical Electron Microscope with Enhanced Atomic-Level Spectrometry and Low-Voltage Performance Masashi Watanabe, Lehigh University, DMR 1040229 Broader Impact: Development of an automated aberration tuning method: the SIAM method To utilize the new ACAEM efficiently, the PI in conjunction with Dr. H. Sawada, JEOL has developed an autotuning procedure (the SIAM method [1]: Fig.3) for atomic-resolution imaging on a crystalline specimen. Even though the latest ACAEM is used, high level skills are required for advanced applications such as atomic-resolution imaging/analysis. The essential step of instrument tuning is still a problematic issue for many inexperienced users. To reduce the load on operators, the SIAM method can now be used to auto-tune the microscope. By applying the SIAM method, the atomic-resolution lattice fringes now appear clearly without any manual adjustment. Since there is no automated tuning procedure available utilizing a crystalline specimen, this procedure is an important development. This tool will be used not only for training new users of the instrument, but also during Lehigh Microscopy School. Fig. 3 Schematic summary of the SIAM auto-tuning procedure: (a) an original HAADF-STEM image from SrTiO 3 ; (b) image after applying the SIAM procedure; (c) the dialog box for the SIAM method; (d) progress of the defocus value, (e) variation of the two-fold astigmatism value and (f) a through focal- series of images for autocorrelation calculation. Fig. 3 (a)(b) (f) (c) (d) (e)


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