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Performances of epitaxial GaAs detectors E. Bréelle, H. Samic, G. C. Sun, J. C. Bourgoin Laboratoire des Milieux Désordonnés et Hétérogènes Université Pierre et Marie Curie (Paris 6)
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Introduction Material for X-ray imaging Bulk Epitaxial Semi-insulating Thick enough Large defect concentration, Low defect concentration, → Non-uniform electronic properties Residual doping (10 13 -10 14 cm -3 ) → Short life time → Small depleted depth Imaging at room temperature Bulk CdTe Epitaxial GaAs (InP, GaP…..) Limited area Large area Bad homogeneity Homogenous No technology Existing technology → Limitation in space charge region
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Aim of the work Growth techniquesThicknes (µm) Energy resolution References MBE1? VPE8 4.4% fwhm for 60 keV gammaHesse et al. (1972) LPE200 30-120 4.5% fwhm for 60 keV gamma 5% fwhm for 60 keV gamma Alexiev et al. (1992) Gibbons et al. (1972) CVPD (!)40-325 0.9% fwhm for 60 keV gammaOwens et al. (2002) LPVPE40 0.2% fwhm for 5 MeV alphaBates et al. (1999) Chemical Reactionup to 500? Epitaxial GaAs detector
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What has been achieved by Chemical Reaction method: A. Growth of thick epitaxial GaAs layers: 100-500 µm thick layers Homogenous electronic properties Electronic properties similar to that of standard epilayers B. Pixel technology: Polishing Ion implantation + annealing Photolithography Chemical etching Si 3 N 4 deposition Metallic alloy deposition ohmic contact (Au, Ge, Ni) p + ion implantation GaAs epilayer n + substrate (Cz GaAs)
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Oscilloscope (1M ) p + /i/n + Bias (10 V) C. Photo current induced by X-ray What has been achieved by Chemical Reaction method:
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Results 1. Proton detection GaAs detector : 2 mm 2, 4.3 x 10 14 cm -3, bias of 100 V (depleted depth 18.4 µm) Retrodiffusion of 1.2 MeV (a) and 1.3 MeV (b) protons
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Results 2. Electron detection Si detector: 25 mm 2, depleted depth 100 µm at 50 V GaAs detector: 2 mm 2, depleted depth about 13 µm at 50 V.
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Results 3. Alpha detection ( 241 Am)-5.49 MeV Bias of 80 V
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Results 4. Gamma detection ( 241 Am)- 59 keV Cooled at –50C, at bias of 70V:
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Conclusion 1. Good energy resolution 2. Width of the space charge region, small ! Decrease of the residual doping Work in photocurrent 3. Optimise the technology of the detector.
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