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Published byJames Flowers Modified over 9 years ago
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Facility meeting Nov. 2013 Gopal Lithography Bay Equipments: Laser writer EVG Mask aligner MJB4 mask aligner EVG Bonder E-Line system Pioneer E-beam system
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Other Issues: E-line- Laser resonator is replaced. E-line was down(14,15thNov.)- Load lock switch was broken. Replaced with the spare switch got from local agent Bonder quartz bond glass plate got fabricated in CENTUM Local fabrication cost, about Rs.15000, EVG quoted about 1.25 lakhs. It is working….
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Trend chart Nov. 2013 : E-line
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Trend chart. Nov.2013 : Pioneer
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Resist: AZnLoF Spin coated at 3000rpm for 40 sec. Thickness: 2um Soft bake 1 min at 110C Exposure for 8 seconds in MJB4 Post exposure bake for 1 min at 110C Development for 25 secs (AZ726MIF) Trend chart: Nov.2013:
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Trend chart : Nov.2013 Resist: AZ5214E Spin coated at 6000rpm for 40 secs Thickness: 1 um Soft bake 1 min at 110C Exposure 50 mJ/cm2 in EVG620 Development for 18-20 secs (AZ351B 1:4)
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Laser writer trend from Nov-12 to Nov- 13 Resist: S1813 Spin coated at 4000rpm for 40 secs Thickness: 1.3 um Soft bake 1 min at 110C Dose: Lens-5, Filter-3%, Gain-12, D-step-2, Pos speed -1 Development for 38 secs (AZ351B 1:4)
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Laser writer trend from Oct -13 to Nov- 13
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SEM image of Mask
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Thanks
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