1. ESD SYSTEM OVERVIEW Sample Holder plate Bias Filament Cu Sample 1 2 B-A gaugeRGA Bias Sample Electrometer Butterfly valve Pumping group Conductance Gas Injection Line Filament Filament Power Supply Transport rod Full Range Gauge

2. ESD SYSTEM OVERVIEW

3. Cu SAMPLES

4. Circuit A A V V +15 V 2-3 A 35 KV

5. Cu Samples main steps: Machining  Cleaning  Heat treatment  ESD

6. Bake – out: lower part 1 2 3 4 5 6/11 7 8 9 10

7. Bake – out: upper part 1B 2B 3B 4B

8. RGA scans

9. RGA scans (valve closed)

10. Degassing: 9 Cycles @ 0.35KV

11. Degassing: 9 Cycles @ 0.70KV

12. Degassing: 9 Cycles @ 1.5KV

13. Calibration: H 2 Calibration Factor

14. Calibration: N 2 Calibration Factor

15. Calibration: N 2 2 nd set of data Calibration Factor

16. Degassing: 30 Cycles @ 0.35 KV

17. CURRENT!!!!!

18. Desorption Yield

19. 15 RGA Cycles for background Signal + biassing of the sample 15 RGA Cycles with the filament switched on filament + sample degassing

20. Desorption Yield switch on the filament 15 RGA Cycles for background pressure 15 RGA Cycles with the sample biased

21. Desorption Yield @ 0.35 KV

22. Desorption Yield @ 10 KV

23. N2 calibration

24. Energy correlation

25. Desorption Mechanisms

27. Stopping power and Range Kinetic energyStopping Power (MeV cm 2 /gr) MeVCollisionRadiativeTotal 1.00E-021.32E+011.21E-021.32E+01

28. Stopping power and Range Kinetic Energy MeV Range gr/cm2 Thickness cm 1.00E-02 4.601E-04 5.15E-05

29. Energy correlation

31. Circuit A A V V +15 V 2-3 A 35 KV

32. Extra-electron source Positive Polarization [KV] Current [μA] Negative Polarization [KV] Current [μA] 70-0.2-70.6 81.1-1.2-80.8 92.2-91.8 103.9-105 1530-15100

33. Degassing @ 5 KV

34. Improvements