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Published byThomas Morris Modified over 9 years ago
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Session 5: Projects 1
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Physical Limits of Technology Scaling : 2 SCALING AND EFFICIENCY
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RLC extraction : 3 Inductance Modeling Reducing Capacitance Skin Effect / Anomalous Skin Effect
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Interconnect Delay : 4 High Speed Global On-Chip Interconnects Compact Model for Delay Near Speed-of-Light On-Chip Electrical Interconnects Moment-Matching Technique
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Interconnect Noise : 5 Moment-Matching Technique
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Repeater Insertion: 6
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Bit Rate Limitation : 7 Data Integrity : maximum data transfer rate. Digital communication Throughput-Centric Wave-Pipelined Interconnect
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Process Variations : 8
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Power Dissipation : 9
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Clock Distribution : 10
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3D Integration: 11 Electrical modeling of Interconnects in 3-D ICs
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Speed/Power/Area Tradeoffs : 12
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Power Distribution / Electromigration : 13 Design / Analysis / Optimization of power distribution network Local power distribution network Global power distribution network
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Impact of Cu vs. Al Metallization on Performance : 14
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Thermal Modeling of Metallic Interconnects : 15
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CNTs as Interconnect: 16 PERFORMANCE COMPARISON BETWEEN COPPER, CARBON NANOTUBE, AND OPTICS FOR OFF-CHIP AND ON-CHIP INTERCONNECTS
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Optical Interconnects : 17
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