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LC Tracking Review at Amsterdam 2003.03.31 Overview of Asian Tracking R&D Vertex Detector Silicon µ-Strip Intermediate Tracker Central Tracker - Jet Chamber - Si µ-strip Central Tracker Hwanbae Park Kyungpook National Univ.
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LC Tracking Review at Amsterdam 2003.03.31 ▣ JLC: Tracker
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LC Tracking Review at Amsterdam 2003.03.31 ▣ Vertex Tracker Working Group CCD based Vertex Tracker Group Y. Sugimoto*, A. Miyamoto (KEK) N. Tamura, G. Iwai, K. Fujiwara, H. Takayama (Niigate U.) K. Abe, T. Nagamine (Tohoku U.) T. Aso (Toyama National College of Maritime Technology) http://www-jlc.kek.jp/subg/svd/
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LC Tracking Review at Amsterdam 2003.03.31 S/N > 10 @278K Intrinsic Resolution Is better than 3 um. √ operation at near room temperature √ spatial resolution, S/N ratio √ partially thinned wafers √ radiation hardness √ fast readout ▣ R&D Activities: Vertex Tracker
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LC Tracking Review at Amsterdam 2003.03.31 ▣ Intermediate Tracker Working Group Silicon Intermediate Tracker Group H. Park* (Kyungpook National U.) I.H. Park (Ewha Womans U.), B.G. Cheon (SKKU) H.J. Kim, J.H. Kang, Y.J. Kwon (Yonsei U.) J.S. Kang (Korea U.), S. Kim, J. Lee (SNU) 76.5cm 18.5cm
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LC Tracking Review at Amsterdam 2003.03.31 √ linking and reconstruction efficiency (Fast Simulation) √ track momentum resolution (Full Simulation) √ Si PIN diode simulation/design/fabrication √ S/N ratio measurement and beam test ▣ R&D Activities: Intermediate Tracker SiSi Bare Si wafer Oxidatio n N+ (Diffusio n) UV Mas k 1 Photo Lithography Oxide Etching Photo-resist Strip P+ (Implantatio n) Ma sk2 UV Photo Lithography Photo-resist Strip Metal deposition Metal Etching
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LC Tracking Review at Amsterdam 2003.03.31 ▣ Central Tracker Working Group Jet Chamber Si µ-strip M. Kobayashi*, K. Fujii (KEK) M. Iwasaki*, H. Aihara N. Khalatyan (U. of Tsukuba) (U. of Tokyo) A.M. Bacala (MSU), K. Hoshina (TUAT) T. Abe (Nagoya U.),K. Watanabe (Kogakuin U.) http://www-jlc.kek.jp/subg/cdc/
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LC Tracking Review at Amsterdam 2003.03.31 4.6 m Test Jet Chamber (6 axial and 10 stereo super layers) √ measurements of wire tensions and positions √ cosmic ray tests with a candidate gas mixtures √ space charge effect measurement √ basic chamber studies with “baby” chamber √ spatial and momentum resolution √ two track separation √ wire material studies √ full CDC detector simulator based on Geant4 ▣ R&D Activities: Jet Chamber
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LC Tracking Review at Amsterdam 2003.03.31 (with NLC detector parameters) √ Full Simulation Study for detector parameter √ reconstruction efficiency √ momentum resolution √ photon background simulation ▣ R&D Activities: Si µ-strip central tracker - - - #hit 1 in central & #VXD hit=5 - - - #hit 2 in central & #VXD hit=5 - - - #hit 3 in central - - - #hit=5 in central |cos |<0.8
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LC Tracking Review at Amsterdam 2003.03.31 ▣ Summary □ Vertex Detector - spatial resolution and distortion of thin wafers measured - innermost layer survive more than 3 years under option “A” - radiation damage effect studied □ Intermediate Tracker - fast and full simulation with 5 layers - Si µ-strip R&D proposal submitted (pending) □ Central Tracker - chamber parameters studied with “baby chamber” - track momentum and two track separation - Si µ-strip R&D started (detail simulation studies carried)
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