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CHAPTER ONE SEMICONDUCTORS Copyright, 2006 © Ahmed S. Bouazzi 2e A G.I. Module Energie Solaire المدرسة الوطنية للمهندسين بتونس
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The Crystal Lattice of Silicon Each silicon atom is situated at the center of a tetrahedron and connected to four other atoms occupying the summit of the tetrahedron.
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A two dimension representation of the silicon crystal structure Intrinsic silicon Si Each silicon atom is situated at the center of four other atoms.
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N-type Semiconductors n-doped silicon P P P P Si
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P-type Semiconductors p-doped silicon Si B B B
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Energy Interatomic distance Eg Permitted levels (a) (b) The Gap
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Fermi Level [ F(E) is the probability for an electron to be in the E energy level] In intrinsic silicon, E F is situated in the middle of the gap. In doped silicon, the Fermi level goes up or down depending on the electron concentration.
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Semiconductor Doping The doping atoms create localized levels inside the band gap.
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Energy v E E F c E c E v E Semiconductor Metal Electron-hole Pairs
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Intrinsic Carrier Concentration = 4 = 4 for silicon at 300 K, n i 2 = 2x10 20 cm -6 np = (m e m h ) 3/2 exp
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In n-type silicon: Minority and Majority Carriers n = N D p no N D = n i 2 p no = n i 2 / N D In p-type silicon: p = N A n po N A = n i 2 n po = n i 2 / N A
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In n-type silicon: Minority and Majority Carriers in Excess n n0 = N D ≈ 10 16 – 10 18 cm -3 p n0 N D = n i 2 ; p no = n i 2 / N D ≈ 2×10 4 – 2 × 10 2 cm -3 Creating n = p ( ≈ 10 11 – 10 14 cm -3 ) electron- hole pairs will give: n n = n n0 + n ≈ N D and p n = p n0 + p ≈ p
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Minority and Majority Carriers in Excess In p-type silicon: p p0 = N A ≈ 10 16 – 10 18 cm -3 n p0 N A = n i 2 ; n po = n i 2 / N A ≈ 2×10 4 – 2 × 10 2 cm -3 Creating n = p ( ≈ 10 11 – 10 14 cm -3 ) electron- hole pairs will give: p p = p p0 + p ≈ N A and n p = n p0 + n ≈ n
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Lifetime and Recombination N = N o exp In the bulk: At the surface: J sur = q(n p - n po )S is the lifetime of the minority carriers. S is the surface recombination velocity of minority carriers.
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Diffusion Length L = The diffusion length is the free path of the minority carriers before recombination. is the lifetime of the minority carriers. D is the diffusion constant of minority carriers.
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Absorption Coefficient The absorbed quantity of photons at the depth x is: 0 is the flux of photons arriving at the surface of the semiconductor and x is the depth. x 00 0
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Drift Minority Carriers Current in a Semiconductor Electrons: J n = qn p µ n E and n = qn p µ n
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Holes: J p = qp n µ p E and p = qp n µ p
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J n = qD n n p (x,y,z) J p = – qD p p n (x,y,z) Diffusion Minority Carriers Current in a Semiconductor
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J = J n + J p Electrons: J n = qn p µ n E + qD n n p (x,y,z) Holes: J p = qp n µ p E – qD p p n (x,y,z) Total Minority Carriers Current
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E c E v E F E g p n Junction plane p-n Junction Depletion region
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PHOTOVOLTAIC EFFFECT (1) The p-n Junction
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E c E v E f Electrons current Holes current The photocurrent under illumination PHOTOVOLTAIC EFFFECT (2)
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PHOTOVOLTAIC EFFFECT (3) The photovoltage under illumination
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Depletion Region Where the built-in voltage is defined by:
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Polarization of a p-n Junction direct inverse
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I-V Characteristic
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Saturation Current np =np =; p n =; L k = J o =
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Metal/semiconductor junction E c E v Semiconductor E F metal E c E F E v (a) (b) (c) Schottky Diode and Ohmic Contacts
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