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Published byBartholomew McCormick Modified over 9 years ago
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Substitute beer and pizza?
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Basic Silicon Solar Cell as fabricated in Cameron With Schematic
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A detailed traveler is used to define the process steps
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The process begins with a silicon wafer, 100mm in diameter, (100) orientation, PRIME grade, p-type boron doped, 1-10 ohm-cm resistivity
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The process begins with a silicon wafer, 100mm diameter, (100) orientation, PRIME grade, p-type boron doped, 1-10 ohm-cm resistivity Shown in cross section of wafer
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The wafer is cleaned using the sulfuric acid/hydrogen peroxide clean
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Using PECVD (plasma enhanced chemical vapor deposition) the back side is coated with SiO2 to prevent doping of the backside
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Using POCl 3 as the source for phosphorus doping an n-region will be created in the p- type silicon wafer POCl 3 bubbler – nitrogen is bubbled through the liquid POCl 3 and carries phosphorus into the tube
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With the POCl 3 running into the tube, phophorus is diffused into the silicon wafer at 950C
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A n-region is now diffused into the silicon wafer at 950C
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A metal film (aluminum) is sputtered on the top surface and a photolithographic mask creates a conductive grid in the metal
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A metal film (Aluminum) is sputtered on the top surface and a photolithographic mask creates a conductive grid in the metal
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Positive photoresist is spun on the metal coated wafer
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A transparency mask of the top side grid is placed on top of the photoresist coated wafer and exposed to UV
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The image is developed which leaves the metal conductor pattern
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With photoresist protecting the metal, the unprotected metal is etched away leaving the top side grid pattern in metal
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A metal film is evaporated on the top surface and a photolithographic mask creates a conductive grid in the metal
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A second metal film (aluminum) is deposited on the back for backside contact
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A second metal film is deposited on the back for backside contact
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Using PECVD (plasma enhanced chemical vapor deposition) an anti-reflective coating of SiO2 is deposited on the top surface
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Using PECVD (plasma enhanced chemical vapor deposition) a anti-relective coating of SiO2 is deposited on the top surface
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Individual cells are diamond saw cut from the wafer
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Electrical testing (I-V trace) of the cell is performed under a solar light simulator Calibration cell determines the intensity of sunlight
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Electrical testing (I-V trace) of the cell is performed under a solar light simulator
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Blue trace is without sun light, red trace is with sunlight at 1.0 sun
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Completed Solar Cell
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Assignment Lecture 4 assignment from web site
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