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Synthesis of photo-sensitive compounds containing cinnamate moieties for application on photo-alignment of liquid crystal 1 南台化材 Reporter : Chih-Hao Li(

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Presentation on theme: "Synthesis of photo-sensitive compounds containing cinnamate moieties for application on photo-alignment of liquid crystal 1 南台化材 Reporter : Chih-Hao Li("— Presentation transcript:

1 Synthesis of photo-sensitive compounds containing cinnamate moieties for application on photo-alignment of liquid crystal 1 南台化材 Reporter : Chih-Hao Li( 李志豪 ) Advisor : Ching-Dong Hsieh Date: 100.09.01

2 Fig. 1. 1 H NMR spectra of the DOD-Ci. Before irradiation After irradiation 1 H NMR

3 3 UV-Vis Fig. 2. The change of UV absorbance of polymer solution with UV irradiation, (a)PCEMA, (b)PCEMA/DOD-Ci = 9/1, (b)PCEMA/DOD-Ci = 8/2, (b)PCEMA/DOD-Ci = 7/3. (a)(b) (c) (d)

4 南台化材 4Conclusions 1. 1 H NMR showed that DOD-Ci was synthesized sucessfully and DOD-Ci containing cinnamate groups can produce [2+2] photoaddition reaction upon their exposure to linearly polarized ultraviolet (LP-UV) light. 2. As the weight percent of the DOD-Ci increased from 0 to 30%, the photostability times of the polymer decreased from 30min to 4min.

5 Future work 1.Observe the changes of UV absorbance of polymer solution with UV irradiation by UV-vis spectroscopy, (a)EDCi,(b) PCEMA/EDCi. 2.Observe the changes of UV absorbance of polymer films with UV irradiation by UV-vis spectroscopy. 3.Observe the POM images of liquid crystal cell.


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