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Facilities in the Molecular and Materials Physics group Bill Gillin Dept of Physics
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Optical Spectroscopy Photoluminescence –Tunable (215nm – 2500nm) pulsed (~6ns) excitation Can be used for time resolved measurements with detection in the range ~300-1700nm Also photoluminescence excitation spectroscopy –CW 405nm and 532nm pump lasers
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Spectroscopic ellipsometery –Horiba Jobin Yvon UVISEL NIR instrument on order 260-1700nm wavelength range Automatic variable angle goniometer 40°-90° (0.01° step) Microspot optics 0.05, 0.1 and 1mm spot size Heated sample stage RT-600°C Liquid sample cell
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Time of flight –Facilities for photoconductivity measurements to measure carrier mobilities in organics –Tuneable excitation using OPO –Ultrafast measurements using 355nm or 266nm
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Electrical Characterisation A range of source measure units with current measurement down to femtoamps These can be used for transistor characterisation
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Photolithography Spin coater Karl Suss MJB3 Mask Aligner Bakeout oven Also have UV light box for crude photolithography
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Deposition systems Two dedicated organic evaporation systems –6 organic sources 2 metal sources –4 organic sources 2 metal sources Both systems have shadow mask facilities Also one general purpose evaporator mainly used for metal evaporation
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Other equipment Dektak 3ST surface profiler Oxygen plasma system
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