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Published byRandell Hodges Modified over 9 years ago
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Photo lithography
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Why? Add a photo sensitive layer ontop of a material. After treating with UV light, remove the affected areas. After processing (e.g. etching) remove remaining layer. Transfer a pattern onto a material How
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Pattern transfer in four steps 1.Exposure 2.Development 3.Processing; e.g. etching 4.Stripping
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1 Exposure Material to be patterned Fotomask Fotoresist Light source
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Material to be patterned Fotoresist 2 Developement Developer (solution)
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Compare photo mask and resulting resist Fotomask Patterned photoresist Material Resulting structure
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Etchant solution Patterned photoresist Material 3 Processing, e.g etching
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Patterned photoresist Patterned Material Resulting structure
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4 Stripping Stripping solution Patterned photoresist Patterned Material
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Resulting structure Patterned Material Compare photo mask and resulting resist Fotomask
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Reflections Why/when is fotolithography needed? How is a mask created? Why do mask and resulting structure differ? Which parameters influence the result?
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