1. 1 12&13/05/2005 Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL Outgassing Evaluation More Moore, SP3 WP6, for Task 3.6.1.6.1 and 3.6.2.3 Elettra and AZ Electronic Materials Athens 12.Mai 2005

2. 2 12&13/05/2005 Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL Objectives for Outgassing Low or no Outgassing chemicals is a requirement for the EUV exposure tool shelf life First specifications for outgassing are given by ASML Resist outgas specifications for Alpha tool: H 2 0 4.7E15 (molec/s*cm 2 ) C x H y (integr. > 44 AMU) 4.7E13 F/Cl 4.7E14 S/P 4.7E11 Si 4.7E9 PAG fragments (S/P) most critical IntelOutgassing 5*10 10 [molecules/cm²] at E size (only internal)

3. 3 12&13/05/2005 Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL Intel and Sematech are working on outgassing test procedure for outgassing characterization of of outgassing behavior of EUV resists and related materials: a) qualitativly b) quantitativly Outgassing experiments within More Moore and ExCite are needed to have test equipment and to get experience are needed to characterize the EUV resist materials are needed for selection of appropriate EUV resist material.

4. 4 12&13/05/2005 Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL Intel

5. 5 12&13/05/2005 Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL Where More Moore stands Outgassing test equipment set up at Elettra Synchrotron Trieste

6. 6 12&13/05/2005 Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL PHS-Methacrylate Polymer m/e=28,CO, C2H4 m/e=44; CO 2 m/e=15,CH 3 m/e=12-18, Polymer m/e=27-30, Polymer m/e=43-45, Polymer

7. 7 12&13/05/2005 Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL PHS-Methacrylate Polymer + PAG (TPS-Triflat) m/e=48; SO m/e=64; SO 2 m/e=12-18, Polymer m/e=27-30, Polymer m/e=44-45, Polymer  m/e=78; C 6 H 6 m/e=69; CF 3 m/e=31-40, PAG m/e=20,HF m/e=26, PAG

8. 8 12&13/05/2005 Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL PHS-Methacrylate based EUV Photoresist m/e=48; SO m/e=64; SO 2 m/e=12-18, Polymer m/e=28, Polymer m/e=43-45, Polymer m/e=31,38 PAG m/e=78, C6H6,PAG

9. 9 12&13/05/2005 Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL

10. 10 12&13/05/2005 Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL m/e=48; SO m/e=64; SO 2 PHS-Methacrylate Polymer + PAG (TPS-Triflat)

11. 11 12&13/05/2005 Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL m/e=48; SO m/e=64; SO 2 PHS-Methacrylate Polymer + PAG (TPS-Nonaflat)

12. 12 12&13/05/2005 Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL Methacrylate Polymer Based Resist

13. 13 12&13/05/2005 Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL Methacrylate Polymer Based Resist

14. 14 12&13/05/2005 Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL Conclusion PAGs, which create Perfluorsulfonic acids outgass under EUV with SO,SO 2 More data needed Confirmation of reliability and precicion of measurement Analyses of mass fragments Quantification of outgassing in relation to specification of exposure tool