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Chemistry 140a Lecture #5 Jan, 29 2002
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Fermi-Level Equilibration When placing two surfaces in contact, they will equilibrate; just like the water level in a canal lock. The E F of the semi-conductor will always lower to the E F of the metal or the solution. This can be understood by looking at the density of states for each material/soln. Initial E F Semi-ConductorMetal/Soln. Eq. E F Initial E F Eq. E F
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Fermi-Level Equilibration Charge comes from the easiest thing to ionize, the dopant atoms. This leads to a large region of (+) charges within the semi-conductor. In the metal all of the charge goes to the surface. (Gauss’s Law) The more charge transferred the more band bending. E x EFEF EFEF E x EFEF E CB E VB E CB V bi E x EFEF EFEF E x EFEF E CB E VB E CB V bi
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Depletion Approximation All donors are fully ionized to a certain distance, W, from the interface. W=W(N D,V bi ) X W NDND W V bi W +++++ ---------- ----------
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Final Picture E x EFEF EFEF E x EFEF E CB E VB E CB V bi E Vac sc mm EgEg ------ ++ +
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Useful Equations Poisson’s Eqn: E(x) E(x) = Electric Field (V/cm) (x) = Electric Potential (V) (x) = Electric Potential Energy (J)
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Electric Potential (V) Integrate Poisson’s Eqn. B.C.’s Result: X W +++++++ Q=qN D W ---------- ---------- x) qN D -qN D W 2 (2K 0 ) (x) x quadratic V bi =
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Depletion Width Rearranging for W: As expected, W increases w/ V bi and decreases w/ N D If one accounts for the free carrier distribution’s tail around x=W
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Typical Values V bi max (V)N D (cm -3 ) W ( m) Q (C/cm 2 ) 110 13 1110 110 16 0.363*10 11
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Electric Potential Energy E(x) = -q (x) (0) = -V bi qV bi = (E F,SC -E F,M ) B = V bi + V n –Barrier height –Independent of doping –V bi and V n are doping dependent (x) x E x EFEF E CB E VB V bi BB e-e- h+h+ Net = 0 @ Eq. VnVn
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Electric Field (V/cm) E(x) W E max =-qN D W/(K x E x)
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I-V Curve No Band Bending Low Band Bending High Band Bending I V
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Review N-typeP-type E x EFEF E CB E VB V bi E Vac sc mm EgEg ------ ++ + E x EFEF E CB E VB V bi E Vac sc mm EgEg ++++++ __ -
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Solution Contact 10^17 atoms in 1mL of 1mM solution D.O.S. argument holds Difference in exchange current across the interface ++++ ++++ A- Li + 5-10 Angstroms *Significantly less than typical W ~ 10nm
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Semiconductor Contacting Phase No longer 1-Sided Abrupt Jxn. as the semi-conductor doesn’t have infinite capacity to accept charge Assume N D (n-type)=N A (p-type), then W n =W p e- h+ n-type p-type Diode directionalized current
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Degenerate Doping Dope p-type degenerately N A >>N D --> 1-sided Abrupt Jxn. WnWn WpWp P-N Homojunction N-type B B B P + -type
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Heterojunctions 2 different semiconductors grown w/ the same cyrstal structure (difficult) –Ge/GaAsa o ~5.65 angstroms NormalStaggered Broken
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LASERs 3 Pieces --> 2 Heterjunctions –p - (Al,Ga)As | GaAs | n - (Al, Ga) As e-e- h+h+ h Traps electrons and holes
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Fermi-Level Pinning E F,M 1 Ideal Case (only works for very ionic semiconductors like TiO 2 and SnO 2) Never works for Si Fermi-Level Pinning Sze p. 278 Slope A-B 1 CdS TiO 2 SnO 2 Si GaAs
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What’s Missing? Fermi-Level pinning hurts –Hinders our ability to fine tune V bi V bi/Ni ~V bi/Pt ~V bi/Au Why does this happen? E x EFEF E CB E VB E Vac BB E x EFEF E CB E VB E Vac BB vs. *Solution contact for GaAs sees Fermi-level pinning, while the barrier height correlates well with the electro-chemical potential for solution contact to Si
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Devious Experimenter Given a Si sample with a magic type of metal on the surface X Thus the Fermi-level will alwaysequilibrate to the Fermi-level of X Thin interface --> e - ’s tunnel through it and no additional potential drop is observed E x E F,X E CB E VB E x E F,X E CB E VB E F,X -E F,M
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What is X? Any source or sink for charge at the interface –Dangling bonds –Surface states –etc.
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Questions –Abrupt 1-sided junction (What is it?) –Sign of Electric P.E. and Electric Potential (Are they correct? I put them as they were in the notes, but this doesn’t seem to agree with the algebra to me)
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