1. Kristal Chamberlain Wellesley College Class of 2012

2.  Multilayer Mirrors Imager for Magnetopause to Aurora Global Exploration (IMAGE) – “It’s a weather satellite for space storms” -Dr. James L. Burch  Lithography and High-Resolution Microscopy

3.  Ceramics and Glass Applications  Use In Metal-Oxide Semiconductor devices  Catalyst in for chemical reactions  High-temperature superconductor YBCO  produce phosphors, which provide the red color in color television tubes NASA rocket combustion chamber. The silver-colored lining is a highly robust alloy of Nickel, Chromium, Aluminum and Yttrium (Photo: NASA)

4.  Reactively Sputtered  Surface Anneal  Cleaning Methods  Measurement using Ellipsometry  Identification and Record Keeping

5.  Theories Tested  Film oxidation Too thick  New Deposition Blank Silicon Wafer- no growth  Oxidation of Silicon Substrate Thickness decreased in furnace

6.  Importance of Distance from VUV Lamp

7.  Formation of an Ozonide

8.  Water Expansion Ding Lamp Exposure

9.  Necessity of VUV Interaction with Sample

10.  Formation of Nitrogen Containing Product

11.  Use TEM (Transmission Electron Microscope) to characterize new material being formed  Figure out how to transfer the new material onto the delicate TEM grid Sputtering destroys grids VUV process destroys grids

12.  Thanks SO much to:  Dr. Allred  The BYU Thin Film Optics Research Group  Brigham Young University Physics Department Staff  National Science Foundation REU program

13.  N. Brimhall, N. Herrick, D.D. Allred, R.S. Truly, M. Ware, and J. Peatross, “Characterization of optical constants for uranium from 10 to 47 nm,” Applied Optics Vol. 49 No. 9 (2010).  B. R. Sandel, A. L. Broadfoot, C. C. Curtis, R. A. King, T.C. Stone, R. H. Hill, J. Chen, O. H. W. Siegmund, R. Raffanti, D. D. Allred, R. S. Turley, and D. L. Gallagher, “The extreme ultraviolet Imager investigation for the IMAGE mission,” Space Sci. Rev. 91, 197–242 (2000).  J. X. Zhang, G. Ceder, T. Maxisch, W. K. Chim, and W. K. Choi, Phys. Rev. B 73, 104101 (2006).  D. Mortenson, “Determining the Cause of Yttria Film Growth due to Exposure to Vacuum-Ultraviolet Light”, Student Thesis, Brigham Young University (2010).  R. A. Serway and J. W. Jewett, Physics for Scientists and Engineers, With Modern Physics, 7 th ed. (Tomson, Brooks/Cole Company, 2008) p. 978-1098  R. Sandberg, D.D. Allred, R. Robinson, A. Jackson, “Cleaning of Hydrocarbon Buildup on Metallic Thin Films,” (APS) Four Corners Meeting at University of Utah, Salt Lake City, UT (2002)