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Review of Ion Beam Sputtering Ramin Lalezai ramin@atfilms.comramin@atfilms.com, voice: 720-494-4194 x-26 Advanced Thin Films, 105 S. Sunset St Suite G, Longmont, CO 80501.History of the Kaufman ion source.Early days of ion beam sputtering.The modern IBS machines.Characteristics of IBS optical coatings -environmental stability -losses -stress.Materials which can be deposited using IBS.”Intrinsic” contaminants in IBS films
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Herman Oberth and the ABMA rocket team (Early 1950s)
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Ion beam sputtering of optical coatings was invented by technologists at Litton in the early 1970s.
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Technology Ion Beam Sputtering Dense films (not porous) Excellent adhesion Stable and durable No spectral shift Low loss Easy to clean Indefinite lifetime
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Comparison of E-beam evaporated, IAD, and IBS coatings E-beam: Porous. Columnar structure. High scatter. Poor environmental stability. IAD: Increased density. Reduced porosity. High stress. Improved environmental stability. IBS: Dense films. Minimal structure. Low scatter. No porosity. Excellent environmental stability
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Spectral shift due to moisture (%). Stress coefficient of mirror coatings (MPa).
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λmaterialSubsTrans ppm Total loss ppmA&S ppmmeasured by 308nmHfO2ATF12601795535Mark YeoCU 369nmTa2O5ATF-2.5cm230362132Andrew GrierMITV4-664 369nmTa2O5ATF-10cm23030273Andrew GrierMIT 405nmTa2O5ATF153924Steve BrownNOAA 514nmTa2O5ATF6104Steve BrownNOAA 635nmTa2O5ATF484RLATFV5-1 qualification 698nmTa2O5GO462RLATF V3-320 JILA Cavity 852nmTa2O5ATF&REO0.42.1<2Tracy NorthupCal Tech 1064nmTa2O5GO73?<0.5*LIGO* Absorption only 1392nmTa2O5ATF43632TigerRegular Process 1392nmTa2O5ATF473TigerLow water films Measured Losses
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Materials which can be grown using IBS Most oxides Ta2O5, Nb2O5, V2O5, TiO2, ZrO2, HfO2, Al2O3,Y2O3, SiO2, … Most nitrides Si3N4, AlN, TiN, … Most elements Si, Al, Pt, … IBS is generally not suitable for the deposition of fluorides and zinc compounds.
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Intrinsic Contaminants in IBS Films 1- Argon (working gas) 2- Water (typically the last element in the vacuum system)
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